On the synergy manipulation between the activation temperature, surface resistance and secondary electron yield of NEG thin films

Wang, Sihui; Zhu, Bangle; Gao, Yonghao; Shu, Xin; Wei, Wei; Zhang, Wenli; Wang, Yong

doi:10.1016/j.apsusc.2021.152101

Cited by 10 publications

(2 citation statements)

References 30 publications

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“…be attributed to the capture of the O atoms released by the reduction of Cu-, V-, and Ti-oxides during baking, which is consistent with the previous study [35,36]. Although the thin is partly activated during measurement, considering that the baking time is just 1 h, it is reasonable to speculate that the film can be fully activated by prolonging the baking time or increasing the baking temperature.…”

Section: Jinst 17 T08003supporting

confidence: 89%

Surface characterization and secondary electron yield measurement of the Ti-Zr-V films deposited on laser-etched copper

Zhang¹,

Zhu²,

Wang³

et al. 2022

J. Inst.

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The electron multipacting effect and distributed vacuum profile, induced by the interaction of the particles in vacuum chamber with the surrounding walls, are the significant issues in modern accelerators. Laser-etching the inner surface of the vacuum chambers can effectively eliminate the electron multipacting effect, and depositing the non-evaporable getter (NEG) film on the vacuum chamber walls can provide distributed pumping properties. In the present study, Ti-Zr-V NEG films were prepared by magnetron sputtering technique on laser-etched oxygen-free copper (OFC) with different deposition times. The secondary electron yields (SEY), activation kinetics, and resistance of the samples were evaluated. The results show that although the SEYs of the coated laser-etched samples are higher than those of the uncoated laser-etched sample, the maximum SEY values are still below the threshold of the operation requirements. The Ti-Zr-V film deposited on laser-etched surface exhibits obvious nucleation phenomenon with columnar microstructure and can be activated at 180^∘C. Moreover, the coated laser-etched samples present lower resistance compared with the uncoated laser-etched sample. The combination of the laser-etching technique and the NEG thin film is aim to provide a practical treatment for the vacuum chambers in modern accelerators.

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Section: Jinst 17 T08003supporting

confidence: 89%

Surface characterization and secondary electron yield measurement of the Ti-Zr-V films deposited on laser-etched copper

Zhang¹,

Zhu²,

Wang³

et al. 2022

J. Inst.

Self Cite

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“…This would lead to unacceptable levels of ohmic heating as well as beam instabilities [29]. The wakefield impedance was affected by the thickness and resistivity of the NEG films [30,31]. The decrease in thickness and resistivity reduces this undesired resistive effect.…”

Section: Introductionmentioning

confidence: 99%

Research on the deposition and properties characterization of novel conductive getter films on the inner wall of accelerator vacuum chamber

Ge,

Ma,

Zhu

et al. 2023

J. Inst.

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The new generation diffraction-limited storage ring has small vacuum chamber apertures, resulting in a distributed vacuum problem. Depositing a Ti-Zr-V NEG film layer on the inner face of vacuum chambers is an ideal solution for resolving the non-uniform vacuum distribution problem. However, Ti-Zr-V NEG coatings on the surface of the vacuum chamber increase its surface resistivity, which can intensify the wakefield impedance effect. This article proposes adding conductive Ag to the Ti-Zr-V NEG film. A novel Ti-Zr-V-Ag NEG film not only has good vacuum performance, but also has good conductivity. Ti-Zr-V-Ag NEG film is successfully prepared by magnetron sputtering. The activation kinetic processes and surface resistivity of Ti-Zr-V-Ag and Ti-Zr-V NEG films are detected in detail, and comparative research on the activation behavior and surface resistivity of Ti-Zr-V-Ag films deposited with various sputtering pressures is investigated. The results show that adding pure metallic silver to the Ti-Zr-V film effectively decreases the DC resistivity of the NEG films, and this reduction can be further enhanced by reducing the sputtering pressure. The activation kinetics behavior of the Ti-Zr-V-Ag film shows minor degradation compared with that of the Ti-Zr-V film.

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Preparation and characterization of Ti–Zr–V–Cu getter films

Yang,

Huang,

Wang

et al. 2024

Radiat Detect Technol Methods

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On the synergy manipulation between the activation temperature, surface resistance and secondary electron yield of NEG thin films

Cited by 10 publications

References 30 publications

Surface characterization and secondary electron yield measurement of the Ti-Zr-V films deposited on laser-etched copper

Surface characterization and secondary electron yield measurement of the Ti-Zr-V films deposited on laser-etched copper

Research on the deposition and properties characterization of novel conductive getter films on the inner wall of accelerator vacuum chamber

Preparation and characterization of Ti–Zr–V–Cu getter films

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