2005
DOI: 10.1016/j.susc.2005.09.001
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One-dimensional chain structures produced by Ce on Si(111)

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Cited by 9 publications
(4 citation statements)
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“…In the first one, cerium was deposited onto the preliminarily formed Si(111)1 × 1-Pb surface with a 1 ML Pb coverage (1 monolayer (ML) = 7.8 × 10 14 cm −2 ) at room temperature (RT) followed by short annealing at about 400 °C. In the second procedure, Pb deposition onto the Ce-induced quasi-one-dimensional reconstructions on Si(111) (in particular, 5 × 2-Ce with 1/5 ML coverage and 3 × 2-Ce with 1/3 ML coverage 34–36 ) was employed. Except for the increase of surface roughening in the second case due to Si mass transport (Ce/Si(111) reconstructions have extra Si atoms in the form of Seiwatz and honeycomb chains 36 ), we observed no difference in the final (Pb, Ce)/Si(111) surface.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In the first one, cerium was deposited onto the preliminarily formed Si(111)1 × 1-Pb surface with a 1 ML Pb coverage (1 monolayer (ML) = 7.8 × 10 14 cm −2 ) at room temperature (RT) followed by short annealing at about 400 °C. In the second procedure, Pb deposition onto the Ce-induced quasi-one-dimensional reconstructions on Si(111) (in particular, 5 × 2-Ce with 1/5 ML coverage and 3 × 2-Ce with 1/3 ML coverage 34–36 ) was employed. Except for the increase of surface roughening in the second case due to Si mass transport (Ce/Si(111) reconstructions have extra Si atoms in the form of Seiwatz and honeycomb chains 36 ), we observed no difference in the final (Pb, Ce)/Si(111) surface.…”
Section: Resultsmentioning
confidence: 99%
“…Deposition rates were calibrated using STM observations of well-defined surface reconstructions with various coverages in the Pb/Si(111) system 24,26 and quasi-one-dimensional nanowire surface reconstructions in the Ce/Si(111) system. [33][34][35][36][37][38][39] STM images were acquired using Omicron variable-temperature STM-XA operating in a constant-current mode. Mechanically cut PtIr tips were used as STM probes after annealing in a vacuum.…”
Section: Experimental and Calculation Detailsmentioning
confidence: 99%
“…Different parallel CeSi x NW arrays were produced by depositing high-purity (99.95%) Ce metals with coverages ranging from 1 to 9 ML (1 ML = 9.59 × 10 14 atoms/cm 2 ) onto a single-domain Si(110)-16 × 2 surface at 675 K with a deposition rate of 0.15 ML/min and subsequently annealed at 875 K for 20 min. The growth temperature cannot be higher than 675 K; otherwise, a large amount of Ce clusters will be formed [ 20 , 21 ]. Ce metals were evaporated from an electron-beam evaporator with an internal flux meter; their deposition coverage was determined in situ by a quartz crystal thickness monitor with an accuracy of 20%.…”
Section: Methodsmentioning
confidence: 99%
“…Since a high-oxygen-concentration region was observed at the surface of the Si:Ce film by SIMS measurement, the existence of the valence state, of Ce 4þ in the Si:Ce film is attributed to the formation of Ce 4þ -O bonding [22][23][24]. The peak at around 887.0 eV (solid line) corresponds to a state of dissolved Ce in a Si crystal (solid line),[25][26][27] which is apparently different from the spectrum of stable silicide reported in refs 25. and 26, which should be observed at 884.4 eV.…”
mentioning
confidence: 99%