Low-coverage vanadia species (monomers, dimers, trimers, and one-dimensional vanadia rows) as well as
vanadium oxide films of varying thickness supported on the metastable κ-Al2O3(001) surface are investigated
by density functional theory in combination with statistical thermodynamics. At low-vanadium chemical
potentials and typical reducing conditions, species with V−O(3)−Al interface bonds are stable. These aggregates
are partially reduced with vanadium in the VIII oxidation state. This correlates with defect formation energy
values for the initial removal of lattice oxygen in the range of 1.3−2.7 eV. As the length of the polymeric
species increases, the reduction energy decreases. We demonstrate that the support structure does affect the
structure of the model catalyst and the lattice oxygen bond strength. On the α-Al2O3(0001) surface, the only
stable low-coverage VO
x
species are dimers with V−O(2)−Al interface bonds and a defect formation energy
of 2.8 eV. Reduction remains more facile for vanadia films on κ-Al2O3 than on α-Al2O3. The systematic
lower values relate to the presence of tetrahedral sites that allow for significant lattice relaxation upon reduction.
Using the oxygen defect formation energy as a reactivity descriptor, we discuss possible effects of the support
structure and vanadia loading in Mars-van Krevelen-type oxidation reactions. We also analyze the influence
of the support structure on the interface vibrational modes.