1999
DOI: 10.1007/s003390050863
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One-step microfabrication of fused silica by laser ablation of an organic solution

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Cited by 222 publications
(124 citation statements)
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“…[13][14] Laserinduced backside wet etching (LIBWE) has two types: the excimer laser exposure projection-mask type that has high size precision, and the laser scanning irradiation type where the prototypes can be made easily (Fig. 11).…”
Section: High-quality Microfabrication Of Hard-brittle Materialsmentioning
confidence: 99%
See 1 more Smart Citation
“…[13][14] Laserinduced backside wet etching (LIBWE) has two types: the excimer laser exposure projection-mask type that has high size precision, and the laser scanning irradiation type where the prototypes can be made easily (Fig. 11).…”
Section: High-quality Microfabrication Of Hard-brittle Materialsmentioning
confidence: 99%
“…The processing depth increases in proportion to the cumulative pulse number by conducting concurrent irradiation. [13] Compared to other methods, the photoresist protection layer formation and its removal, which were necessary in the conventional lithography process, as well as vacuum devices are not necessary, and the pretreatment and post-treatment are greatly simplified.…”
Section: High-quality Microfabrication Of Hard-brittle Materialsmentioning
confidence: 99%
“…Furthermore, hybrid laser ablation methods based on the utilization of absorbing surface-adherent layers or media allow the use of cost-efficient nanosecond laser sources. These methods are known as laser-induced plasma-assisted ablation (LIPAA) [9,10], laser-induced backside wet etching (LIBWE) [11,12], laser etching at a surface adsorbed layer (LESAL) [13,14] and laser-induced backside dry etching (LIBDE) [15]. Recently, nanosecond laser ablation of optical glasses by introducing assisting atmospheric pressure plasmas to the ablation process was investigated.…”
Section: Introductionmentioning
confidence: 99%
“…Some earlier studies on microchannel fabrication with this method are, for instance, UV light irradiation of photostructurable glass followed by post wet chemical etching, [15][16][17] fs-NIR direct writing of photostructurable glass followed by post wet chemical etching [18][19][20][21] fs-NIR laser irradiation of silica followed by post wet chemical etching, 22 and instant etching during laser irradiation, i.e., laserinduced backside wet etching (LIBWE). [23][24][25] Instead of using wet chemical etching, an effective method has been developed to fabricate 3D homogeneous microchannels by water-assisted fs direct writing inside porous glass followed by postannealing for consolidation recently. 26,27 Microchannels with arbitrary lengths and configurations could be achieved inside glass.…”
Section: Introductionmentioning
confidence: 99%