2007
DOI: 10.1016/j.bios.2006.10.039
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One step processing of aminofunctionalized gate oxides

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Cited by 20 publications
(18 citation statements)
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“…Figure 8(a) shows the differences in the FTIR spectra as chemical or thermal oxidation treatment is used for stabilizing PSi. The most intense band at 1050-1100 cm -1 corresponding to asymmetric stretching in SiO [27] is present both in CoxPSi and ToxPSi; however, the intensity of this band is weaker in CoxPSi. This means that ToxPSi is a harsher oxidation process than CoxPSi, as also evident from the disappearance of the SiH peak at 615 cm -1 in ToxPSi.…”
Section: Resultsmentioning
confidence: 94%
See 1 more Smart Citation
“…Figure 8(a) shows the differences in the FTIR spectra as chemical or thermal oxidation treatment is used for stabilizing PSi. The most intense band at 1050-1100 cm -1 corresponding to asymmetric stretching in SiO [27] is present both in CoxPSi and ToxPSi; however, the intensity of this band is weaker in CoxPSi. This means that ToxPSi is a harsher oxidation process than CoxPSi, as also evident from the disappearance of the SiH peak at 615 cm -1 in ToxPSi.…”
Section: Resultsmentioning
confidence: 94%
“…The as-prepared PSi has a characteristic band at 615 cm -1 referred to as SiH. After Cox, two bands appear at every step of surface modification: a strong band at 1050-1100 cm -1 , assigned to asymmetric stretching in SiO [27], and a weak band at 835-795 cm -1 from the Si-OH bond [28]. It is clear that Cox stabilization leads to mostly oxidized PSi.…”
Section: Resultsmentioning
confidence: 99%
“…Infrared spectroscopy (IR) is another useful tool for the surface chemical modification studying, in particular, for SAM investigation [19][20][21]. The FT-IR spectrums for the SAMs used in this work are presented in Fig.…”
Section: Ft-ir Resultsmentioning
confidence: 99%
“…There are fewer reports on silanization in the vapor phase. 9,2025 Vapor-phase modification offers obvious advantages in eliminating solvent use and not having substrates in direct contact with silane solutions in terms of avoiding excess water 9 and direct depositions of silane oligomers/polymers onto substrates. Vapor-phase depositions generally result in smooth silane monolayers, 2023 which are attractive for many applications.…”
Section: Introductionmentioning
confidence: 99%