Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks

Abstract

In prior work, progress was shown in the systematic characterization of the process space for efficient and effective repair of extreme ultraviolet (EUV) photomasks using an ultrafast (femtosecond) pulsed deep ultraviolet (DUV) laser apparatus. In this work, the full analysis and conclusions, along with any additional test results are shown. This includes an analysis of the impact of laser repair on the phase shift of the multilayer using multiple processes.

Solid-state femtosecond UV lasers: recent advances and challenges

“…An excellent example is a rollable AMOLED display fabricated by ink-jet printing and laser lift-off technology, which is very promising for manufacturing large-size flexible AMOLED [6]. Semiconductor industry applications such as wafer scribing and dicing [7], micromachining of GaN [8], and extreme ultraviolet photomask repair [9,10] also highly benefit from femtosecond UV laser development. Other fields of applications where femtosecond NUV and DUV sources are used and have huge potential are medical device processing [11], direct medical applications [12], glass processing [13] and laser-induced periodic surface structuring [14].…”