We explored for the first time the ability of a three-dimensional polyacrylonitrile/ZnO material prepared by a low-cost and scalable synthesis method based on the combination of electrospinning and atomic layer deposition (ALD) as a new material with a large surface area to enhance the performance of UV photodetection. The UV photoresponse current was enhanced by a factor of 250 compared to a flat electrode. In addition an increase by a factor of 1.3 of the recovery time has been observed which is negligible versus the huge amount of current enhancement. The greatly improved performance and the good stability of these nanostructured electrodes induce exciting materials for use in UV sensor applications.
A IntroductionUV photodetection has been widely studied in the last few years 1-10 due to its large civil and military application elds such as secure space-to-space communications, pollution monitoring, water sterilization, and ame sensing. The semiconductor based UV photodetection process is a simple physical phenomenon based on electron-hole generation into a semiconductor under photon shelling. Basically when a photon with energy larger than the one of the semiconductor band-gap is absorbed, an electron-hole pair is produced. This induces a change of the electrical conductivity properties of the semiconductor. Low band gap energy semiconductors have been widely used for UV photodetection, especially the Si-based photodetectors (E g ¼ 1.1 eV). Despite both their high sensitivity and quick response advantages, low E g UV photodetectors are sensitive to low energy photons (visible and infrared), and thus, they require the insertion of protection lters to avoid signal/ noise related to those low electron energies. Moreover an ultrahigh vacuum and a very high voltage supply were required. 11 The disadvantages of the low E g based photodetectors disappear in the high band gap semiconductors. Moreover, wide-band gap materials are both chemically and thermally stable which is an advantage for devices operating in harsh environments. [12][13][14] Among the high band gap semiconductor category, ZnO is one of the most widely used semiconductors for UV photodetection due to its high chemical stability, low cost, and large band gap of 3.37 eV at room temperature. Mollow et al. reported the rst UV photoresponse in ZnO lms in 1940. 15 Since then, many complex ZnO-based photodetectors with high performance have been reported, such as p-n junction, p-i-n junction and Schottky junction. 3,16-23 ZnO UV sensors have been prepared using different deposition techniques such as Metal Organic Chemical Vapor Phase Deposition (MOCVD), 24,25 laser assisted molecular beam deposition (LAMBD), 26 radio frequency (RF) magnetron sputtering, 27-29 atomic-layer deposition (ALD) 30 and molecular beam epitaxy (MBE). 31,32 Moreover different electrode types such as Au, Ag, Pt, Ni, Pd, Cr, Al, and Ru have been elaborated and their performances have been investigated. Nanostructured ZnO for UV detection was also investigated. They show promisi...