2009
DOI: 10.1021/nl803316h
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Operation of Graphene Transistors at Gigahertz Frequencies

Abstract: Top-gated graphene transistors operating at high frequencies (gigahertz) have been fabricated and their characteristics analyzed. The measured intrinsic current gain shows an ideal 1/f frequency dependence, indicating a FET-like behavior for graphene transistors. The cutoff frequency f T is found to be proportional to the dc transconductance g m of the device, consistent with the relation f T ) g m /(2πC G ). The peak f T increases with a reduced gate length, and f T as high as 26 GHz is measured for a graphen… Show more

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Cited by 1,018 publications
(756 citation statements)
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“…Although several high-k inorganic dielectrics, such as HfO 2 , Al 2 O 3 , and ZrO 2 , have been applied to the fabrication of graphene FETs, they cannot be available for flexible devices based on plastic substrates due to their high growth temperature. 8,12,13 This paper reports a promising method for fabricating a low-voltage operating graphene FET array on plastic substrates using an ion gel as the gate dielectric. The ion gel consists of a room temperature ionic liquid and gelating triblock copolymer, which exhibits an extremely high capacitance of 5.17 µF/cm 2 .…”
mentioning
confidence: 99%
“…Although several high-k inorganic dielectrics, such as HfO 2 , Al 2 O 3 , and ZrO 2 , have been applied to the fabrication of graphene FETs, they cannot be available for flexible devices based on plastic substrates due to their high growth temperature. 8,12,13 This paper reports a promising method for fabricating a low-voltage operating graphene FET array on plastic substrates using an ion gel as the gate dielectric. The ion gel consists of a room temperature ionic liquid and gelating triblock copolymer, which exhibits an extremely high capacitance of 5.17 µF/cm 2 .…”
mentioning
confidence: 99%
“…The thin film is not able to grow directly on graphene or CNTs, except for edges or where there are defects as shown in Figure 4(a), so they need functionalization before the ALD growth [62,63]. Non-covalent functionalization layer (NCFL) can be formed prior to ALD growth via molecules like DNA [62], 3,4,9,10-perylene tetracarboxylic acid (PTCA) [63], and NO 2 shown in Figure 4(b) [64][65][66][67]. Besides molecules, polymer can also play the role of NCFL, such as NFC polymers [54,68,69], and ozone pre-treatment (Figure 4(c)) is proved to work for ALD growth as well [70].…”
Section: High-κ Dielectric Growth On Graphenementioning
confidence: 99%
“…Moreover, directly constructing nucleation layer via oxidation of thin film of evaporated or sputtered Al (several nm), followed by Al 2 O 3 ALD growth, is also a choice to form dielectric on graphene surface [71,72]. Unfortunately, functionalization will cause some problems, such as introducing extra scattering centers and surface damages, hence reducing the current and transconductance as shown in Figure 4(d) [67,73]. The interlayer functional molecule will also introduce a gap between the channel and gate oxide, largely reducing the gate modulation efficiency, and hence weakening the transistor performance.…”
Section: High-κ Dielectric Growth On Graphenementioning
confidence: 99%
“…[6][7][8][9][10][11] The realization of high-speed basic circuit components 12,13) has emphasized the need for highperformance digital units using graphene, and several logic inverter devices have been demonstrated using mechanically exfoliated graphene at cryogenic temperatures. [14][15][16][17] However, these devices have been a real challenge due to some unique properties of graphene, such as the ambipolarity and the zero bandgap, which led to undesirable imperfect complementary logic operation with excessive on/off state current resulting in input/output logic-level mismatch, therefore, their performances are still not comparable to silicon complimentary metal-oxide-semiconductor (CMOS), and far from the practical requirements.…”
Section: Introductionmentioning
confidence: 99%