“…Typically, p-type semiconductor nanocrystals are synthesized by doping intrinsic materials with trivalent impurities (such as boron, aluminum, or gallium) during fabrication while n-type semiconductor nanocrystals are created via the incorporation of pentavalent dopants (such as phosphorus, arsenic, or antimony). For semiconductor nanocrystals, the intentional doping plays a critical role in enhancing the materials' original electrical, 33 optical, 34,35 and magnetic 36 properties, leading to a wide range of applications for transistors, 23,37 photovoltaics, 38 thermoelectric devices, 39 and light-emitting devices. 40 However, alongside the incorporation of p-/n-type dopants, redundant holes (h + ) or electrons (e − ) are introduced into the nanoscale network as well, 41 making it possible to generate reactive oxygen species (ROS) via two potential pathways: oxidation of water at the surface of nanocrystals (OH − + h + → • OH) 42 or reduction of molecular oxygen (O 2 + e − → O 2…”