1996
DOI: 10.1063/1.362477
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Optical and electrical investigations of indium oxide thin films prepared by thermal oxidation of indium thin films

Abstract: Indium oxide thin films have been prepared by thermal oxidation of vacuum-deposited indium thin films in air in an open furnace at about 600 K. These indium oxide thin films prepared by thermal oxidation have been examined for optical transparency by measuring their optical absorbance as a function of wavelength. From the optical absorption data, optical band gap and the nature of the forbidden energy gap in the indium oxide thin films have been determined. Electrical conductivity measurements have also been c… Show more

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Cited by 66 publications
(25 citation statements)
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“…A wide range of deposition technologies has been used for the preparation of indium oxide films, such as dc and rf sputtering [6,7], evaporation [8,9], thermal oxidation of indium films [10], pulsed laser deposition [11], atomic layer epitaxy [12], spin coating [13] and the sol-gel method [14]. Sputtering is chosen very often among these techniques due to its high deposition rates, good film properties and process stability.…”
Section: Introductionmentioning
confidence: 99%
“…A wide range of deposition technologies has been used for the preparation of indium oxide films, such as dc and rf sputtering [6,7], evaporation [8,9], thermal oxidation of indium films [10], pulsed laser deposition [11], atomic layer epitaxy [12], spin coating [13] and the sol-gel method [14]. Sputtering is chosen very often among these techniques due to its high deposition rates, good film properties and process stability.…”
Section: Introductionmentioning
confidence: 99%
“…5, the nearly linear responses for the In 2 O 3 and N:In 2 O 3 thermocouples reflect the low thermocouple resistance relative to the input resistance of the data acquisition system. The activation energy for InO 2 is estimated at 12 meV [28], making the resistance drop from room temperature to 1000°C only 30%. The AlZnO thermocouple, though with a resistance nearly 10 times the input resistance of the data acquisition system, shows a marked increase of thermopower over 700°C.…”
Section: Resultsmentioning
confidence: 99%
“…In order to study the oxygen diffusion, a common way to investigate the resistance kinetics via a set of R(t) curves measured at various temperatures [5,6] was chosen. It is worth to note, however, that at high temperatures (T > 650 K) the oxygen in-and outdiffusion for In 2 O 3−x is relatively fast.…”
Section: Resultsmentioning
confidence: 99%