“…A wide range of deposition technologies has been used for the preparation of indium oxide films, such as dc and rf sputtering [6,7], evaporation [8,9], thermal oxidation of indium films [10], pulsed laser deposition [11], atomic layer epitaxy [12], spin coating [13] and the sol-gel method [14]. Sputtering is chosen very often among these techniques due to its high deposition rates, good film properties and process stability.…”