Optical and electrical properties of indium tin oxide thin films with tilted and spiral microstructures prepared by oblique angle deposition

Zhong, Y.; Shin, Young Chul; Kim, C.M.; Lee, B.G.; Kim, E.H.; Park, Y.J.; Sobahan, K. M. A.; Hwangbo, Chang Kwon; Lee, Y.P.; Kim, T.G.

doi:10.1557/jmr.2008.0312

Cited by 60 publications

(21 citation statements)

References 16 publications

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“…The fabrication of highly porous and/or sculptured ITO thin films has been attempted by e-beam OAD from ITO pellets, both under high vacuum conditions [316][317][318][319][320][321][322][323][324][325][326][327] and in a carrier gas flux (usually nitrogen) [320,[328][329][330]. Fig.…”

Section: Transparent Conductive Oxidesmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

618

436

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a b s t r a c tThe oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in vacuum or in the presence of a plasma, mechanistic simulations are critically revised, discussing well-established paradigms such as the tangent or cosine rules, and proposing new models that explain the growth of tilted porous nanostructures. In the second part, we present an extensive description of applications wherein oblique-angle-deposited thin films are of relevance. From there, we proceed by considering the requirements of a large number of functional devices in which these films are currently being utilized (e.g., solar cells, Li batteries, electrochromic glasses, biomaterials, sensors, etc.), and subsequently describe how and why these nanostructured materials meet with these needs.

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Section: Transparent Conductive Oxidesmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

618

436

View full text Add to dashboard Cite

show abstract

“…Oblique angle deposition (OAD) is a convenient method to fabricate thin films with a variety of nanostructures and unique optical properties [12][13][14][15]. Recently, transparent conductive thin film prepared by OAD technique is confirmed to improve the optical, electrical and light emitting properties of liquid crystal display (LCD) and light emitting diode (LED), which shows greatly potential application in photoelectrical field [16][17][18]. However, to our best knowledge, as one of important transparent conductive thin films, the research on ATO thin films prepared by OAD technique has not been reported.…”

Section: Introductionmentioning

confidence: 99%

Optical and electrical properties of SnO2:Sb thin films deposited by oblique angle deposition

Xiao

Dong

Shao

et al. 2010

Applied Surface Science

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“…2(a), therefore, the n and k values of the TiO 2 film deposited at θ α = 80° are lower than those of TiO 2 film at θ α = 0° due to the increase of porosity within the film. The porosity within the film can be calculated by a well-known Bruggeman effective medium approximation [12]. The porosity of the TiO 2 film deposited at θ α = 80° was estimated to be approximately 55% from the parameters, i.e., n low = 1.438 and n high = 2.053 at λ = 540 nm.…”

Section: Methodsmentioning

confidence: 99%

Tunable distributed Bragg reflectors with wide-angle and broadband high-reflectivity using nanoporous/dense titanium dioxide film stacks for visible wavelength applications

Leem¹,

Guan²,

Yu³

2014

Opt. Express

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Highly-tolerant distributed Bragg reflectors (DBRs) based on the same materials consisting of nanoporous/dense titanium dioxide (TiO2) film pair structures with wide-angle and broadband highly-reflective properties at visible wavelengths are reported. For a high refractive index contrast, the two dense and nanoporous TiO2 film stacks are alternatingly deposited on silicon (Si) substrates by a oblique angle deposition (OAD) method at two vapor flux angles (θα) of 0 and 80° for high and low refractive indices, respectively. For the TiO2 DBRs at a center wavelength (λ(c)) of 540 nm, the maximum level in reflectance (R) band is increased with increasing the number of pairs, exhibiting high R values of > 90% for 5 pairs, and the normalized stop bandwidth (∆λ/λ(c)) of ~17.8% is obtained. At λ(c) = 540 nm, the patterned TiO2 DBR with 5 pairs shows an uniform relative reflectivity over a whole surface of 3 inch-sized Si wafer and a large-scalable fabrication capability with any features. The angle-dependent reflectance characteristics of TiO2 DBR at λ(c) = 540 nm are also studied at incident angles (θ(inc)) of 20-70° for p-, s-, and non-polarized lights in the wavelength region of 350-750 nm, yielding high R values of > 70.4% at θ(inc) values of 20-70° for non-polarized light. By adjusting the λ(c)/4 thicknesses of nanoporous and dense films, for λ(c) = 450, 540, and 680 nm, tunable broadband TiO2 DBRs with high R values of > 90% at wavelengths of 400-800 nm are realized.

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Optical and electrical properties of indium tin oxide thin films with tilted and spiral microstructures prepared by oblique angle deposition

Cited by 60 publications

References 16 publications

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Optical and electrical properties of SnO2:Sb thin films deposited by oblique angle deposition

Tunable distributed Bragg reflectors with wide-angle and broadband high-reflectivity using nanoporous/dense titanium dioxide film stacks for visible wavelength applications

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