Optical and Mass Spectra From Reactive Plasma at Magnetron Deposition of Tantalum Oxynitride

Abstract

Processes in reactive plasma during the magnetron deposition of tantalum oxynitride with ICP activation of reactive gas are studied in dependence on Oxygen fraction. Results of spectroscopic study of optical emission from the plasma and of mass-spectrometry of gas composition in the vacuum chamber in response to ignition of magnetron discharge and inductively coupled plasma are presented. It is shown that dissociation level of all species grows with the magnetron current increase while its dependence on oxygen/nitrogen ratio is non-monotonic.

Nanomechanical and Nanotribological Properties of Nanostructured Coatings of Tantalum and Its Compounds on Steel Substrates

“…The deposition parameters of the coatings are summarized in Table 1. These deposition modes were selected after optimization of the spraying technology carried out in [42,43]. The morphology of the coatings was evaluated by the AFM Dimension FastScan (Bruker, Santa Barbara, CA, USA) in PeakForce QNM (Quantitative NanoMechanics, Bruker, Santa Barbara, CA, USA) regime with CSG10_SS (Micromasch, Tallinn, Estonia) cantilevers.…”

“…Deposition process was performed on the experimental set-up (KhNU and NSC KIPT NASU, Kharkov, Ukraine) [ 41 , 42 ]. The physical and chemical processes in plasma were investigated during the reactive magnetron deposition of tantalum oxynitride [ 43 ]. Prior to the deposition, substrates were cleaned in an ultrasonic bath, then the ion cleaning was performed (Hall type ion source) in argon atmosphere (pressure was 6.65 × 10 −2 Pa, ion acceleration voltage—3 kW, ion source current—100 mA) during 5 min.…”

“…The deposition parameters of the coatings are summarized in Table 1 . These deposition modes were selected after optimization of the spraying technology carried out in [ 42 , 43 ].…”