2015
DOI: 10.1016/j.optmat.2014.12.016
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Optical and structural properties of single-crystal lithium niobate thin film

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Cited by 69 publications
(29 citation statements)
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“…In order to achieve the desired LN properties and to avoid light scattering on the multilayer top surface a single-crystal TFLN bonded to an SiO 2 layer on an Si substrate [21] has been used for the on-glass 1DPhC as a first configuration.…”
Section: Fabrication Experimental Details and Discussionmentioning
confidence: 99%
“…In order to achieve the desired LN properties and to avoid light scattering on the multilayer top surface a single-crystal TFLN bonded to an SiO 2 layer on an Si substrate [21] has been used for the on-glass 1DPhC as a first configuration.…”
Section: Fabrication Experimental Details and Discussionmentioning
confidence: 99%
“…1, we propose using lithium niobate (LiNbO 3 ) thin film (lithium niobate on insulator, LNOI) as the on-chip material of gyroscope's resonator, which is an ideal platform for integrated optics due to its high-index contrast. By using crystal ion slicing and wafer bonding methods, single-crystal LN thin films possess excellent optical, nonlinear, and electro-optical properties as bulk materials [28][29][30]. The proposed gyro's schematic consists of a ring laser cavity doped with erbium (Er) ions and the double passive enhancement resonators (DPER) as shown in Fig.…”
Section: Theoretical Modelmentioning
confidence: 99%
“…Due to the high E-O coefficient (r 33 = 31.2 pm/V) in LN, high-quality E-O modulators of this type are very valuable in optical communication [11][12][13][14][15]. In the last decade, high-refractive-index contrast in the form of lithium niobate thin film bonded to a SiO 2 layer (lithium niobate on insulator, LNOI) has emerged as an ideal platform for integrated high-performance modulators [16][17][18][19]. A basic challenge in the production of M-ZI modulators in LNOI is the fabrication of high-quality waveguide structures.…”
mentioning
confidence: 99%
“…The material of the device studied was an x-cut LN thin film bonded to a SiO 2 layer deposited on an LN-substrate [17]. The thicknesses of the LN thin film and the SiO 2 layer were 0.5 µm and 2 µm [30], respectively.…”
mentioning
confidence: 99%