Outcoupling of plasmonic modes excited by inelastic electron
tunneling
(IET) across plasmonic tunnel junctions (TJs) has attracted significant
attention due to low operating voltages and fast excitation rates.
Achieving selectivity among various outcoupling channels, however,
remains a challenging task. Employing nanoscale antennas to enhance
the local density of optical states (LDOS) associated with specific
outcoupling channels partially addressed the problem, along with the
integration of conducting 2D materials into TJs, improving the outcoupling
to guided modes with particular momentum. The disadvantage of such
methods is that they often involve complex fabrication steps and lack
fine-tuning options. Here, we propose an alternative approach by modifying
the dielectric medium surrounding TJs. By employing a simple multilayer
substrate with a specific permittivity combination for the TJs under
study, we show that it is possible to optimize mode selectivity in
outcoupling to a plasmonic or a photonic-like mode characterized by
distinct cutoff behaviors and propagation length. Theoretical and
experimental results obtained with a SiO2–SiN–glass
multilayer substrate demonstrate high relative coupling efficiencies
of (62.77 ± 1.74)% and (29.07 ± 0.72)% for plasmonic and
photonic-like modes, respectively. The figure-of-merit, which quantifies
the tradeoff between mode outcoupling and propagation lengths (tens
of μm) for both modes, can reach values as high as 180 and 140.
The demonstrated approach allows LDOS engineering and customized TJ
device performance, which are seamlessly integrated with standard
thin film fabrication protocols. Our experimental device is well-suited
for integration with silicon nitride photonics platforms.