1986
DOI: 10.1063/1.336906
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Optical band gap of indium nitride

Abstract: Room-temperature optical absorption data in the 1.5–2.5-eV range are reported for indium nitride thin films prepared by reactive radio-frequency sputtering. The fundamental absorption edge in high-purity material is located at 1.89±0.01 eV and corresponds to a direct transition at k=0, in agreement with band-structure calculations. A significant Moss-Burstein shift is noted for carrier concentrations in excess of 1019 cm−3 and obeys the empirical relationship EG =1.89+2.1×10−8 n1/3 eV.

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Cited by 615 publications
(326 citation statements)
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“…This feature also occurs in many nitride and oxide semiconductors, such as InN and ZnO. For example, the gap of InN was originally measured to be 2.0 eV for films deposited by sputtering and MOVPE, [19,20] however further investigation of MBE films established the true gap of InN as 0.7 to 0.8 eV [21]. The small direct band gap for some of these compounds suggests that they are not ideal candidates for p-type transparent conducting oxides.…”
Section: Crystal Structurementioning
confidence: 99%
“…This feature also occurs in many nitride and oxide semiconductors, such as InN and ZnO. For example, the gap of InN was originally measured to be 2.0 eV for films deposited by sputtering and MOVPE, [19,20] however further investigation of MBE films established the true gap of InN as 0.7 to 0.8 eV [21]. The small direct band gap for some of these compounds suggests that they are not ideal candidates for p-type transparent conducting oxides.…”
Section: Crystal Structurementioning
confidence: 99%
“…Among the group-III nitrides, InN requires perhaps the most important revisions because its band gap is now accepted 16,17 to be 0.7 eV while it was long believed to be about 1.89 eV. 18 Rinke et al 13 used G 0 W 0 quasiparticle band structures starting from optimized effective potential exact exchange + LDA correlation, but focused on the fit only very near the Γ-point. de Carvalho et al 15 use G 0 W 0 starting from hybrid functional HSE calculations.…”
Section: Introductionmentioning
confidence: 99%
“…Early optical absorption studies [1] on sputtered InN films with relatively high electron concentrations (>10 19 /cm 3 ) and low mobilities (<100 cm 2 /V⋅s) were used to derive a fundamental bandgap of ~1.9 eV. For over a decade it had been accepted that the band gap of InN was 1.9 eV.…”
mentioning
confidence: 99%