Optical characterization of hybrid antireflective coatings using spectrophotometric and ellipsometric measurements

Janicki, Vesna; Sancho‐Parramon, Jordi; Stenzel, Olaf; Lappschies, Marc; Görtz, Björn; Rickers, Christoph; Polenzky, Christina; Richter, Uwe

doi:10.1364/ao.46.006084

Cited by 21 publications

(13 citation statements)

References 24 publications

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“…In order to see the annealing effect on the optical properties of the coatings, the refractive indices were determined by the characterization technique based on least-square fitting to the measured reflectance and transmittance spectra [22]. For sol-gel dip-coating technology, both sides of the glass substrates were coated.…”

Section: Resultsmentioning

confidence: 99%

Thermal Annealing Effect on Optical Properties of Binary TiO2-SiO2 Sol-Gel Coatings

Wang

Zhou

et al. 2012

Materials

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TiO2-SiO2 binary coatings were deposited by a sol-gel dip-coating method using tetrabutyl titanate and tetraethyl orthosilicate as precursors. The structure and chemical composition of the coatings annealed at different temperatures were analyzed by Raman spectroscopy and Fourier Transform Infrared (FTIR) spectroscopy. The refractive indices of the coatings were calculated from the measured transmittance and reflectance spectra. An increase in refractive index with the high temperature thermal annealing process was observed. The Raman and FTIR results indicate that the refractive index variation is due to changes in the removal of the organic component, phase separation and the crystal structure of the binary coatings.

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Section: Resultsmentioning

confidence: 99%

Thermal Annealing Effect on Optical Properties of Binary TiO2-SiO2 Sol-Gel Coatings

Wang

Zhou

et al. 2012

Materials

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“…The best model having the most suitable structure is determined by measuring the difference between the experimental and calculated data expressed by the chi-squared factor v 2 , which is a reduced function of the (root) mean square error (MSE) normalized by the standard deviation of the experimental data point rðkÞ and given by [26]:…”

Section: Ellipsometric Analysismentioning

confidence: 99%

Microstructure and optical dispersion characterization of nanocomposite sol–gel TiO 2 –SiO 2 thin films with different compositions

Kermadi

Agoudjil

Sali

et al. 2015

Spectrochimica Acta Part A: Molecular and Biomolecular Spectros

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“…[2,3] Additionally, TiO 2 thin films have applications as selfcleaning, [4] and antimicrobial surfaces due to their photocatalytic activity. [5] Nb 2 O 5 and Ta 2 O 5 are high-k materials with large band gaps and they have many potential applications such as antireflective coatings, [6] dielectric layers, [7][8][9] and electrochromic devices. [10,11] They have also been investigated as diffusion barriers, [12,13] corrosion protection, [14] and solidstate ion sensors.…”

Section: Group 4 and 5 Metal Oxide Thin Filmsmentioning

confidence: 99%

Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors

Blanquart

Niinistö

Ritala

et al. 2014

Chemical Vapor Deposition

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The atomic layer deposition (ALD) process, an alternative to CVD, is universally appreciated for its unique advantages such as excellent repeatability, conformity, and thickness control at the atomic level. ALD precursor chemistry has mainly been based on homoleptic compounds such as, but not limited to, metal halides, alkylamides, and alkoxides, however these precursors have drawbacks such as possible halide contamination and low thermal stabilities in the case of the alkylamides and alkoxides. Consequently, heteroleptic precursors have been investigated as alternatives to the existing homoleptic counterparts, leading to the development of several advantageous processes. Nevertheless, there is no thematic review dedicated to the heteroleptic precursors and their properties, and it seems that no coherent strategy has been adopted for the development of heteroleptic precursors. This review gives a brief description of ALD and presents studies on the deposition of thin films of groups 4 and 5 metal oxides using ALD. A description of the general ALD properties of homoleptic precursors, in addition to a review on the thermal ALD of groups 4 and 5 metal oxides from heteroleptic precursors, is provided. Trends in the properties of heteroleptic ALD precursors, based on the literature review and recent experimental data, are discussed.

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Optical characterization of hybrid antireflective coatings using spectrophotometric and ellipsometric measurements

Cited by 21 publications

References 24 publications

Thermal Annealing Effect on Optical Properties of Binary TiO2-SiO2 Sol-Gel Coatings

Thermal Annealing Effect on Optical Properties of Binary TiO2-SiO2 Sol-Gel Coatings

Microstructure and optical dispersion characterization of nanocomposite sol–gel TiO 2 –SiO 2 thin films with different compositions

Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors

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