Optical dispersion analysis of TiO2 thin films based on variable-angle spectroscopic ellipsometry measurements

Mardare, Diana; Hones, P.

doi:10.1016/s0921-5107(99)00335-9

Cited by 139 publications

(72 citation statements)

References 18 publications

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“…Similar features were reported for TiO 2 films deposited by sputtering. [15][16][17][18][19][20][21] The refractive index at 500 nm in Fig. 2(b) is 2.49, which is in good agreement with a TiO 2 film prepared under a low pressure condition.…”

supporting

confidence: 75%

Development of microfabricated TiO2 channel waveguides

et al. 2011

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An optical channel waveguide is a key solution to overcome signal propagation delay. For the benefits of miniaturization, development of microfabrication process for waveguides is demanded. TiO2 is one of the suitable candidates for the microfabricated waveguide because of the high refractive index and the transparency. In the present study, conventional microfabrication processes manufactured TiO2 channel waveguides with 1-20 μm width on oxidized Si substrates and the propagation loss was measured. The prepared channels successfully guided light of 632.8 nm along linear and Y-branched patterns. The propagation loss for the linear waveguide was 9.7 dB/cm

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confidence: 75%

Development of microfabricated TiO2 channel waveguides

et al. 2011

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“…In the same zone (i.e., in the visible spectral range as shown in the inset of Fig. 2), in addition to the Cauchy model, the curves n (λ) below the inter-band absorption edge shows a Sellmeier dispersion type dependence as reported in literature (Mardare & Hones, 1999) and could be thus studied by means of the Wemple and DiDomenico single-oscillator model to investigate the average excitation energy E 0 and dispersion energy E d of the deposited material (DiDomenico et al, 1969;Wemple & DiDomenico, 1971). According to this model, the refractive index is related to the energy of the incident photons by the following expression:…”

Section: Optical Constants By Optical Dispersion Modelssupporting

confidence: 76%

Electric Conduction Mechanisms Study within Zr Doped Mn₃O₄ Hausmannite Thin Films through an Oxidation Process in Air

Saïd

Boughalmi

Inoubli

et al. 2017

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In this work further optical and electrical investigations of pure and Zr doped Mn 3 O 4 (from 0 up to 20 at.%) thin films as a function of frequency. First, the refractive index, the extinction coefficient and the dielectric constants in terms of Zr content are reached from transmittance and reflectance data. The dispersion of the refractive index is discussed by means of Cauchy model and Wemple and DiDomenico single oscillator models. By exploiting these results, it was possible to estimate the plasma pulse ω p , the relaxation time τ and the dielectric constant ε ∞ . Second, we have performed original ac and dc conductivity studies inspired from Jonscher model and Arrhenius law. These studies helped establishing significant correlation between temperature, activation energy and Zr content. From the spectroscopy impedance analysis, we investigated the frequency relaxation phenomenon and hopping mechanisms of such thin films. Moreover, a special emphasis has been putted on the effect of the oxidation in air of hausmannite thin films to form Mn 2 O 3 ones at 350°C. This intrigue phenomenon which occurred at such temperature is discussed along with this electrical study. Finally, all results have been discussed in terms of the thermal activation energies which were determined with two methods for both undoped and Zr doped Mn 3 O 4 thin films in two temperature ranges.

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“…Many different techniques can be used to deposit TiO 2 such as sol-gel process [8][9][10], chemical vapour deposition [11][12][13][14][15], ion beam depositions [16], and magnetron sputtering [17][18][19][20][21]. In this project the latter technique has been used to produce titania coatings, which were post-deposition annealed over a range of temperatures to allow their subsequent structural development to be investigated.…”

Section: Introductionmentioning

confidence: 99%

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

et al. 2013

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Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good electro/photochemical proprieties. Consequently, they are widely used as anti-reflective layers in optical devices and large area glazing products, dielectric layers in microelectronic devices and photo catalytic layers in self-cleaning surfaces. Titania coatings may have amorphous or crystalline structures, where three crystalline phases of TiO 2 can be obtained: anatase, rutile and brookite, although the latter is rarely found. It is known, however, that the structure of TiO 2 coatings is sensitive to deposition conditions and can also be modified by post-deposition heat treatments. In this study, titania coatings have been deposited onto soda-lime glass substrates by reactive sputtering from a metallic target. The magnetron was driven in mid-frequency pulsed DC mode. The as-deposited coatings were analysed by micro Raman spectroscopy, X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Selected coatings were annealed at temperatures in the OPEN ACCESSCoatings 2013, 3 167 range 200-700 °C and re-analysed. Whilst there was weak evidence of a nanocrystallinity in the as-deposited films, it was observed that these largely amorphous low temperature structures converted into strongly crystalline structures at annealing temperatures above 400 °C.

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Optical dispersion analysis of TiO2 thin films based on variable-angle spectroscopic ellipsometry measurements

Cited by 139 publications

References 18 publications

Development of microfabricated TiO2 channel waveguides

Development of microfabricated TiO2 channel waveguides

Electric Conduction Mechanisms Study within Zr Doped Mn₃O₄ Hausmannite Thin Films through an Oxidation Process in Air

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

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Optical dispersion analysis of TiO2 thin films based on variable-angle spectroscopic ellipsometry measurements

Cited by 139 publications

References 18 publications

Development of microfabricated TiO2 channel waveguides

Development of microfabricated TiO2 channel waveguides

Electric Conduction Mechanisms Study within Zr Doped Mn3O4 Hausmannite Thin Films through an Oxidation Process in Air

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

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Electric Conduction Mechanisms Study within Zr Doped Mn₃O₄ Hausmannite Thin Films through an Oxidation Process in Air