1983
DOI: 10.1364/ao.22.003220
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Optical elements with ultrahigh spatial-frequency surface corrugations

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Cited by 191 publications
(60 citation statements)
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“…This allows for use of the technology on a much larger range of materials compared to thin films and eliminates the issues related with film-substrate adhesion. The very low levels of reflectance achieved by nature using moth-eye arrays have inspired many attempts to replicate such structures in technologically-important materials including photoresist on glass [6][7][8][9], in quartz [10][11][12][13][14] and in silicon [15][16][17][18][19][20][21]. Applications include solar cells [7,22,23 [27] are often employed for this, however these processes lend themselves to the formation of regular arrays of pillars arranged in a square or hexagonal array across the whole of the patterned area.…”
Section: Introductionmentioning
confidence: 99%
“…This allows for use of the technology on a much larger range of materials compared to thin films and eliminates the issues related with film-substrate adhesion. The very low levels of reflectance achieved by nature using moth-eye arrays have inspired many attempts to replicate such structures in technologically-important materials including photoresist on glass [6][7][8][9], in quartz [10][11][12][13][14] and in silicon [15][16][17][18][19][20][21]. Applications include solar cells [7,22,23 [27] are often employed for this, however these processes lend themselves to the formation of regular arrays of pillars arranged in a square or hexagonal array across the whole of the patterned area.…”
Section: Introductionmentioning
confidence: 99%
“…1͑a͔͒, quartz, 7,8 polymer, 9 GaSb, 10 and silicon [11][12][13][14][15] have been patterned on a scale below the wavelength of incident light to create biomimetic "moth-eye" AR surfaces. A simple understanding of the AR process can be gained by considering incident light responding to a spatial average of the optical properties of any given interface volume dependent on the fraction of substrate to surrounding medium.…”
mentioning
confidence: 99%
“…90 However, a pattern dened in photoresist is delicate and so an etch is oen employed, using the resist as a mask, to transfer the structures into the harder underlying substrate. Examples of patterning glass/quartz substrates this way include using CHF 3 reactive ion etching (RIE) 91 and SF 6 fast atom beam (FAB) etching 92 through a resist mask. To fabricate taller features, a more robust etch mask is oen used.…”
Section: Fabrication Of Articial Moth-eye Structuresmentioning
confidence: 99%