Optical emission, electron temperature, and microstructure of Cu film prepared by magnetron sputtering

Zhao, Qian; Bian, Feng; Zhou, Yang; Gao, Yenan; Wang, S.B.; Ma, Lei; Yan, Zheng; Liu, B.T.

doi:10.1016/j.matlet.2008.06.011

Cited by 8 publications

(3 citation statements)

References 12 publications

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“…The intensities of Cu peaks changed with the Ar pressure systematically. Strong correlations were observed between optical emission, electron temperature, and the microstructure of Cu films [12].…”

Section: Introductionmentioning

confidence: 90%

Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films

2015

Advances in Materials Science and Engineering

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Cu thin films were deposited on Si substrates using direct current (DC) magnetron sputtering. Microstructure evolution and mechanical properties of Cu thin films with different annealing temperatures were investigated by atomic force microscopy (AFM), X-ray diffraction (XRD), and nanoindentation. The surface morphology, roughness, and grain size of the Cu films were characterized by AFM. The minimization of energy including surface energy, interface energy, and strain energy (elastic strain energy and plastic strain energy) controlled the microstructural evolution. A classical Hall-Petch relationship was exhibited between the yield stress and grain size. The residual stress depended on crystal orientation. The residual stress as-deposited was of tension and decreased with decreasing of (111) orientation. The ratio of texture coefficient of (111)/(220) can be used as a merit for the state of residual stress.

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Section: Introductionmentioning

confidence: 90%

Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films

2015

Advances in Materials Science and Engineering

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“…This relationship can be developed, carrying out the deposition process of coatings, simultaneously with a plasma diagnostic method to ensure process control and reproducibility. [15][16][17][18] The emission spectra contain a large amount of information that is relatively easy to obtain. [13] For instance, electrical probes have been widely employed to study the plasma characteristics, with the subsequent improvement of the quality of the deposited thin films.…”

Section: Introductionmentioning

confidence: 99%

Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge

Escobar

Ospina

Quintero

et al. 2018

Contributions to Plasma Physics

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In this work, we present a study of the plasma evolution during tungsten carbon nitride (WCN) coatings production using the repetitive pulsed arc technique. For the coatings production, a tungsten carbide (WC) target, and a mixture of argon and nitrogen as the filled gas were used. The study was carried out for discharges generated with one, two, three, and four pulses. The WCN coatings were characterized by X-ray diffraction (XRD) to identify the phases present in this material. The plasma was experimentally studied by optical emission spectroscopy (OES). A correlation was found between the spectral lines behavior and the material composition evolution. As the number of pulses increased, the intensity of the spectral lines also increased, especially in the case of the atomic lines of nitrogen, NI. The results were analysed to obtain information regarding the reactions in the plasma, as well as the electron temperature and density.

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“…[3] Metallic materials suffer oxidation in ambient condition. The oxidation of copper has been studied under various experimental conditions; [4][5][6][7][8][9][10][11][12][13][14] most of them focused on the oxidation kinetics under high temperature. In contrast, the study on oxidation of copper is rarely reported at room temperature.…”

Section: Introductionmentioning

confidence: 99%

Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance

et al. 2014

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Optical emission, electron temperature, and microstructure of Cu film prepared by magnetron sputtering

Cited by 8 publications

References 12 publications

Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films

Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films

Plasma diagnostic and microstructural study of WCN coatings growth by pulsed vacuum arc discharge

Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance

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