Optical emission spectroscopy diagnostics for plasma parameters investigation in a Duo-Plasmaline surface-wave sustained discharge

Rachdi, Lazhar; Sushkov, V. P.; Hofmann, M.

doi:10.1016/j.sab.2022.106432

Cited by 7 publications

(5 citation statements)

References 38 publications

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“…Peaks that are unmatched (graphs 1-21) are for CO+ and N2+. In the variants of a biogas with the higher concentration of CH4 (Figure 6, graphs 3,5,6,8,9,11,12,14,15,18,18,20,21), there is the observed appearance of O2 4 Σg − → 4 Πu and Hα 3 → 2 [13].…”

Section: Emission Spectroscopy Of Biogasmentioning

confidence: 97%

“…The OES of the ammonia flame shown that atomic spectra of O*, H β , and the molecular spectras of the NH* and OH* components dominate and significantly promote ammonia-combustion performance, including combustion limitation and NO emission. In [13], OES was used for diagnostics with the matter of Duo-Plasmaline surface-wave discharge investigation. Emission specters were recorded in order to perform plasma-density calculations and electron temperature in the Argon environment.…”

Section: Introductionmentioning

confidence: 99%

“…, graphs3,5,6,8,9,11,12,14,15,18,18,20,21), there is the observed appearance of O 24 Σg − →4 Πu and H α 3 → 2[13]. In the ultraviolet region, a CO (B 3 Σ → B 3 Π) spectrum (graphs 7-21) is observed at 283.3 nm (unmarked), which could be counted as proof of intense production of CO.From the graphs, it can be seen that it reaches up to 3000 counts for BG 20/80 composition (graph 19).…”

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confidence: 97%

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Emission Spectroscopy of CH4/CO2 Mixtures Processed in a Non-Thermal Plasma Augmented Burner

2022

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The need for energy resources that do not belong to the group of fossil fuels and a wide availability of various low-calorific gases leads humanity to search for solutions to adapt external sources of force that would allow for the use of these resources. One of such solutions is the usage of non-thermal plasma applications for pre-ignition stage, ignition, and, finally, combustion. Plasma assistance is a promising technology for improving processes of ignition and flame stabilization, as well as propagating flame speed. This study focuses on influence of the non-thermal plasma on both for CH4, CO2 gases, and their mixture in pre-ignition stage by performing emission spectroscopy, and determining tendency of excited species at different frequency rates for optimal plasma parameters to reduce NO formation and increase efficiency during combustion. The results obtained exhibit a non-linear dependence of radical’s emission from the frequency of plasma. As an example of possible profits from correctly choosing plasma parameters, the calorific value of gases increased from 2.86 times for BG25/75 to 4.78 times for BG30/70. However, the decomposition on higher frequencies causes higher rates of nitrogen-bands emissions, which would increase NOx emissions in the combustion process.

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Section: Emission Spectroscopy Of Biogasmentioning

confidence: 97%

Section: Introductionmentioning

confidence: 99%

mentioning

confidence: 97%

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Emission Spectroscopy of CH4/CO2 Mixtures Processed in a Non-Thermal Plasma Augmented Burner

2022

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“…Especially in semiconductor manufacturing, it is important to carefully monitor the dynamics of low-temperature plasmas within a processing chamber to increase semiconductor yield. For this reason, many different plasma diagnostic tools have been studied and widely used to unveil the nature of plasmas [6][7][8][9][10][11][12][13][14].…”

Section: Introductionmentioning

confidence: 99%

Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis

Park,

Kim,

Cho

et al. 2024

Sensors

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In this work, we propose our newly developed wafer-type plasma monitoring sensor based on a floating-type double probe method that can be useful for two-dimensional (2D) in situ plasma diagnosis within a semiconductor processing chamber. A key achievement of this work is the first realization of an ultra-thin plasma monitoring sensor with a system thickness of ~1.4 mm, which supports a fully automated robot arm transfer capability for in situ plasma diagnosis. To the best of our knowledge, it is the thinnest accomplishment among all wafer-type plasma monitoring sensors. Our proposed sensor is assembled with two Si wafers and SiO2-based probes; accordingly, it makes it possible to monitor the actual dynamics of processing plasmas under electrostatic chucking (ESC) conditions. Also, it allows for the prevention of chamber contamination issues after continuously exposing the radio frequency (RF) to various processing gases. Using a test-bed chamber, we successfully demonstrated the feasibility and system performance of the proposed sensor, including robot arm transfer capability, vacuum and thermal stress durability, and data integrity and reproducibility. Consequently, compared with the conventional plasma diagnostic tools, we expect that our proposed sensor will be highly beneficial for tool-to-tool matching (TTTM) and/or for studying various plasma-related items by more accurately providing the parameters of processing plasmas, further saving both time and manpower resources required for preventive maintenance (PM) routines as well.

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“…One of the problems is that the strong chemical reaction between the active atoms produced by microwave plasma and the surface of the metal electrodes will lead to electrode corrosion, which will limit the service life of plasma devices [18,19]. Therefore, many studies have proposed electrodeless discharge devices to overcome the problem of electrode poisoning caused by electrode discharge [20], such as surface-wave-sustained discharges [21][22][23], microwave plasma jets [24], plasma guns [25], etc. However, when we apply liquid water to these devices, many additional devices are often added to generate water vapor plasma, such as heating and evaporation equipment or vacuum sealing device.…”

Section: Introductionmentioning

confidence: 99%

A Simple and Stable Atmospheric Pressure Electrodeless Water Vapor Microwave Plasma Torch

Tang

Cui

et al. 2022

Applied Sciences

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An atmospheric pressure microwave plasma source operating on water vapor has many potential applications. To avoid the corrosion of metal electrodes in a traditional water vapor microwave plasma system, we propose a simple water vapor electrodeless microwave plasma device. By introducing a ceramic tube, the device can work directly with liquid water without complex evaporation equipment. This study examined the relationship between microwave power and water vapor torch plasma duration. When the microwave power is greater than 800 W, the plasma torch can be excited permanently and stably without the loss of ceramic. The excitation of the oxygen atom, hydroxyl radical, and hydrogen atom was found using optical spectroscopy, confirming the water vapor’s decomposition. In addition, it was also found that the crystallinity of the ceramic was improved after microwave discharge. This work enriches the microwave plasma techniques for water vapor for various applications, such as electric propulsion, hydrogen production, and surface treatment.

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Optical emission spectroscopy diagnostics for plasma parameters investigation in a Duo-Plasmaline surface-wave sustained discharge

Cited by 7 publications

References 38 publications

Emission Spectroscopy of CH4/CO2 Mixtures Processed in a Non-Thermal Plasma Augmented Burner

Emission Spectroscopy of CH4/CO2 Mixtures Processed in a Non-Thermal Plasma Augmented Burner

Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis

A Simple and Stable Atmospheric Pressure Electrodeless Water Vapor Microwave Plasma Torch

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