2001
DOI: 10.1063/1.1419035
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Optical gain at 1.54 μm in erbium-doped silicon nanocluster sensitized waveguide

Abstract: Articles you may be interested inAbsorption cross section and signal enhancement in Er-doped Si nanocluster rib-loaded waveguides Appl. Phys. Lett. 86, 261103 (2005); 10.1063/1.1957112 Deposition and 1.54 μm Er 3+ luminescent properties of erbium-doped hydrogenated amorphous silicon thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiH 4 with concurrent sputtering of erbium J. Vac. Sci. Technol. A 17, 3230 (1999); 10.1116/1.582047 1.54 μ m Er 3+ photoluminescent properties… Show more

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Cited by 173 publications
(112 citation statements)
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“…With such an idea, Er 3+ doped materials were fabricated and embedded in MOS devices to develop Si-based sources emitting at 1.54 m [10,11]. It was demonstrated later that the inclusion of Si-ncs in Er 3+ doped silica resulted in efficient room-temperature Er 3+ luminescence under optical pumping [12][13][14][15]. The much larger effective absorption cross-section of Si-ncs with regard to Er 3+ ions and the efficient coupling between them was an attractive perspective for the near future.…”
Section: Introductionmentioning
confidence: 99%
“…With such an idea, Er 3+ doped materials were fabricated and embedded in MOS devices to develop Si-based sources emitting at 1.54 m [10,11]. It was demonstrated later that the inclusion of Si-ncs in Er 3+ doped silica resulted in efficient room-temperature Er 3+ luminescence under optical pumping [12][13][14][15]. The much larger effective absorption cross-section of Si-ncs with regard to Er 3+ ions and the efficient coupling between them was an attractive perspective for the near future.…”
Section: Introductionmentioning
confidence: 99%
“…Conventionally, cluster size distribution and density have been controlled by varying either the excess silicon concentration and/or annealing conditions. [6][7][8] It is assumed that the growth and phase separation of Si-ncs is driven by annealing. 9 However, we present results in this paper that point to a significant role for film stress in controlling the formation of nanoclusters.…”
Section: Introductionmentioning
confidence: 99%
“…Much work in this area was motivated by the prospect of room-temperature light sources [68] for CMOS and telecommunications [69], and in particular room temperature lasers. This includes various point defects in Si including Er [70][71][72][73] and other emissive centers giving rise to electric-dipole-mediated transitions [67,[74][75][76][77][78][79][80][81][82], as well as band-edge or Si nanocrystal-based emission processes [83][84][85]. While the efficiencies of many of these emitters fall off exponentially with increasing temperature, the SNSPDs required for this application operate at cryogenic temperatures where many point defects have suitable efficiencies.…”
Section: G Electrically-injected Light Sourcementioning
confidence: 99%