Optical multicoating using low-refractive-index SiO2 optical thin films deposited by sputtering and electron beam evaporation

Tajima, Naoya; Murotani, Hiroshi; Matsudaira, Takayuki

doi:10.1016/j.tsf.2023.139824

Cited by 7 publications

(4 citation statements)

References 19 publications

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“…The refractive index of the SiO2 thin film was similar to the refractive index of quartz (bulk SiO2). Tajima et al reported a refractive index of 1.47 at 540 nm for a SiO2 optical thin film deposited by the DC sputtering method [21]. The refractive index values of Nb2O5 thin films deposited by sputtering methods were previously reported according to processing conditions and film thickness to be in the range of 2.14 to 2.44 at 530 nm [10,22].…”

Section: Resultsmentioning

confidence: 98%

Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering

Kim,

In,

Kim

et al. 2023

Applied Sciences

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SiO2/Nb2O5 multilayer thin films were designed for the special application of an aviation lighting system emitting green light. For optical components in this system to meet requirements such as a high transmittance and durability, SiO2/Nb2O5 multilayer thin films of 60 individual layers were fabricated by a plasma-assisted reactive magnetron sputtering method. As a result, the transmittance spectra were confirmed to have a flat top surface and a square bandwidth. The transmittances of the SiO2/Nb2O5 multilayer thin films in the range of 500 nm to 550 nm was approximately 96.14%. The reason for high transmittance was attributed to the almost matching between the designed and fabricated SiO2/Nb2O5 multilayer thin films. It was found that there was little difference in the total thickness between the designed and fabricated SiO2/Nb2O5 multilayer thin films without interlayer diffusion. The surface roughness and hardness of the SiO2/Nb2O5 multilayer thin films on a glass substrate was 2.32 nm ± 0.19 nm and 6.6 GPa, respectively. These results indicate that SiO2/Nb2O5 multilayer thin films can be applied not only to the optical filters used in aviation lighting devices, but also to various optics applications because of high transmittance.

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Section: Resultsmentioning

confidence: 98%

Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering

Kim,

In,

Kim

et al. 2023

Applied Sciences

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“…(1) High-reflection thin films High-reflection tri-band thin films (1064 nm/532 nm/355 nm) were deposited on φ30×5 mm substrates using an electron beam evaporation process. The reflective coatings employed an HfO2/SiO2 film stack totaling 79 layers and structured as 0.327 (0.8H 1.2L) 17 (0.7H 1.3L) 22 L.…”

Section: Sample Preparationmentioning

confidence: 99%

“…The transmissive window components at the forefront of laser radar systems are primarily prepared by physical methods such as electron beam evaporation (EB) and ion beam sputtering (IBS) [17,18]. High vacuum and solar ultraviolet radiation have a relatively minor influence on these components due to dense film structures, stable mechanical strength, good mechanical https://doi.org/10.1017/hpl.2024.28 Published online by Cambridge University Press properties, and thermal parameters [19,20].…”

Section: Introductionmentioning

confidence: 99%

The influence of space environmental factors on the laser-induced damage thresholds in optical components

Ma,

Guan,

Yan

et al. 2024

High Pow Laser Sci Eng

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This paper systematically investigated the impact mechanisms of proton irradiation, atomic oxygen irradiation, and space debris collision, both individually and in combination, on the laser damage threshold and damage evolution characteristics of HfO2/SiO2 triple-band high-reflection films and fused silica substrates using a simulated near-earth space radiation experimental system. For the high-reflection film samples, the damage thresholds decreased by 15.38%, 13.12%, and 46.80% after proton, atomic oxygen, and simulated space debris (Penetration) irradiation, respectively. The coupling irradiation of the first two factors resulted in a decrease of 26.93%, while the combined effect of all

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“…Thin-film SiO 2 is a material that has been extensively studied and is widely used in numerous applications, such as materials with a low refractive index, a barrier for thermal diffusion, and for improving adhesion or enhancing mechanical strength, among many others [16][17][18][19][20][21][22][23][24]. The properties of SiO 2 and SiO x thin films have also been studied in the mid-infrared range [25][26][27], a spectral region that is of great interest in topics related to blackbody radiation at room temperature [28] or in astronomy, as well as in current research topics such as "epsilon near zero" metamaterials or the fabrication of perfect anti-reflective coatings at specific wavelengths [29][30][31][32][33][34].…”

Section: Introductionmentioning

confidence: 99%

Optical Properties in Mid-Infrared Range of Silicon Oxide Thin Films with Different Stoichiometries

Herguedas,

Carretero

2023

Nanomaterials

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SiOx thin films were prepared using magnetron sputtering with different O2 flow rates on a silicon substrate. The samples were characterized using Fourier transform infrared spectroscopy in transmission and reflection, covering a spectral range of 5 to 25 μm. By employing a multilayer model, the values of the complex refractive index that best fit the experimental transmission and reflection results were optimized using the Brendel–Bormann oscillator model. The results demonstrate the significance of selecting an appropriate range of O2 flow rates to modify the SiOx stoichiometry, as well as how the refractive index values can be altered between those of Si and SiO2 in the mid-infrared range.

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Optical multicoating using low-refractive-index SiO2 optical thin films deposited by sputtering and electron beam evaporation

Cited by 7 publications

References 19 publications

Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering

Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering

The influence of space environmental factors on the laser-induced damage thresholds in optical components

Optical Properties in Mid-Infrared Range of Silicon Oxide Thin Films with Different Stoichiometries

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