Control over the optical near field is a pillar stone of material processing, [1] microscopy, [2] and biosensing [3] at the submicrometer scale. The same applies to scanning probe techniques, [1,4] which produce an impressive spatial resolution, and to colloidal lithography [5] for casting large periodic nanostructure arrays. However, imaging near-field distributions with subwavelength detail [6] remains a challenge in this context. Here we demonstrate imaging of complex two-dimensional (2D) near-field patterns imprinted on photosensitive films, resulting from interference between laser light and light scattered by dielectric microspheres. We achieve control over the resulting patterns by varying the illumination conditions and the size and arrangement of the particles. Using chalcogenide films [7] to record the near field, the imprint produces optical, [8] electrical, [9] and topographical [10] contrast and allows for the writing of erasable features as small as 10 nm. [11] Our technique is directly applicable to any type of scattering particle (size, shape, and material), thus providing a simple way of imprinting its near field.The optical near field in the vicinity of a micro-or nanoparticle illuminated by laser light has a spatial distribution that depends on the complex interplay between the properties of the scattering particle, the laser beam, and the substrate. Specifically, the local field enhancement induced by individual particles or sharp tips has been recently identified as a powerful means for nanopatterning applications, [12,13] opening the possibility to perform subwavelength surface carving of a variety of substrates. [1,14,15] In order to achieve controlled structuring, a detailed knowledge of the complex 2D near-field intensity distribution at the substrate plane is required. While different models have been proposed [12,[15][16][17] to calculate this distribution, they all face the challenge to cope with nonsymmetric complex structures. [18] Near-field ablation of the substrate accompanied by post-mortem atomic force microscopy (AFM) appears to be a powerful experimental method for studying the surface topography. [6] However, this method is hampered by the presence of non-linear interaction phenomena, the complexity of the ablation process, and the resulting debris. Alternatively, scanning near-field optical microscopy [19] (SNOM) has been shown to achieve spatial resolution of %30 nm, although this technique is compromised by the SNOM tip interaction with the near field, which is material-and topography-dependent and thus requires the use of modeling.Here we report an experimental method to directly image with nanometer spatial resolution complex 2D near-field intensity distributions underneath the scattering particle by imprinting a corresponding 2D pattern in thin photosensitive films. The concept of our method is illustrated in Figure 1. A femtosecond laser is loosely focused onto a single particle or arrangement of particles sitting on a thin crystalline Ge 2 Sb 2 Te 5 film, exposing a ...