“…Polycrystalline thin fi lms can be prepared by chemical vapor deposition ( CVD ), as well as vacuum evaporation [3,4] , sputtering [5] , molecular beam epitaxy [6] , layer -wise chemisorptions [7] , chemical vapor deposition [8,9] and liquid -phase atomic layer expitaxy [10] , physical vapor deposition ( PVD ) [11] , spray pyrolysis [12] , molecular beam epitaxy [13 -15] , low -pressure metal organic vapor -phase epitaxy ( LPMOVE ) [16,17] , successive ionic layer adsorption and reaction ( SILAR ) [18] , pulsed layer deposition ( PLD ) [19] , traveling heater ( TH ) [20] , radiofrequency diode sputtering ( RDS ) [21] , chemical wet deposition, and electrodeposition [22 -25] . Each thin -fi lm deposition technique has its own advantages and disadvantages.…”