Optical properties of ion implanted thin Ni films on lithium niobate

Abstract

Abstract. Ion implantation by keV Ar+ ions creates blisters on the surface of thin Ni films deposited on lithium niobate and causes changes in optical properties and structure of Ni film and lithium niobate substrate. Processes of ion implantation and effects of increasing absorption, adhesion, damage threshold are described and explained in the paper. Development of pyroelectric photodetector "thin Ni film -lithium niobate" is proposed.

Modification of optical properties and structure of thin films for enhancing absorption

“…In the papers [5,[13][14], the authors compared absorption of deposited thin Ni, Mo and Pd films on lithium niobate with the same samples implanted by Ar + ions. As shown in AFM and SEM images, the surface of implanted samples was covered by blisters.…”

“…By selecting material composition, type, energy and dose of implantation as well as the temperature of materials and that of further thermal annealing, it is possible to reach large-scale blisters formation ( Fig. 2) that will effectively increase optical absorption of the sample for various applications [5]. Laser irradiation along with ion implantation is one of new effective methods to modify the surface structure.…”

“…Typical microrelief of thin Ni films on lithium niobate implanted by Ar + ions with the energies of 100 keV[5].…”