“…In spite of above bands, absorption stretch Si-OH band at 928.4 cm À1 , a broad Si-OH band around 3664.5 cm À1 [31] and a dominant intense band centered at 2337.6 cm À1 indicating the presence of Si-H stretching quasi phonon modes [22,27] have been also detected. On increasing the deposition temperature a slight increase in Si-H and a slight decrease in Si-OH bond have been observed.…”