Hydrogenated amorphous substoichiometric silicon carbide (a-Si 1Àx C x :H, x < 0,1) thin films and diodes with low carbon content are prepared from a mixture of H 2 , SiH 4 , and CH 4 by plasma-enhanced chemical vapor deposition at a relatively high temperature of 400 C on semi-transparent boron-doped nanocrystalline diamond (B-NCD) electrodes with an underlying Ti grid. Vibration spectra indicate that CH 4 prevents Si crystallization at elevated deposition temperatures and confirm an increasing carbon content up to x ¼ 0.1 for samples grown with SiH 4 /CH 4 flows up to 1:3. Dark current-voltage characteristics of B-NCD/a-Si 1Àx C x :H diodes show a rectifying ratio of about four orders at AE1 V. However, under white light illumination, an energy conversion efficiency of 4% is limited by a high serial resistivity of the B-NCD electrode and S-shaped photocurrent near the open-circuit voltage.