2019
DOI: 10.1039/c9na00585d
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Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography

Abstract: We present new plasmonic nanopore arrays and their optical properties, in particular the influence from short-range vs. long-range ordering.

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Cited by 12 publications
(11 citation statements)
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“…As another control, changing hole diameter did not lead to any significant changes in the reflectance spectrum ( Figure S3 ). Thus, the purpose of the nanoholes (in Au or Pt) is to allow transport of Li + ions to the WO 3 as shown by Hopmann et al 11 However, finite difference time domain (FDTD) simulations on a square lattice 29 did suggest plasmonic activity in the near-infrared for the conventional design (see Figure S4 and related discussion).…”
Section: Resultsmentioning
confidence: 99%
“…As another control, changing hole diameter did not lead to any significant changes in the reflectance spectrum ( Figure S3 ). Thus, the purpose of the nanoholes (in Au or Pt) is to allow transport of Li + ions to the WO 3 as shown by Hopmann et al 11 However, finite difference time domain (FDTD) simulations on a square lattice 29 did suggest plasmonic activity in the near-infrared for the conventional design (see Figure S4 and related discussion).…”
Section: Resultsmentioning
confidence: 99%
“…A convenient feature of the dense nanochamber arrays is that they enable excitation of surface plasmons in the thin gold film due to the short-range ordered pattern. 24,26,27 The extinction spectrum exhibits a Fano-shaped resonance 30 (a peak and a dip) in the red or near infrared region and this feature shifts upon changes in the local refractive index (RI) on the surface. This labelfree readout method, typically referred to as "nanoplasmonic sensing", is well established for affinity-based detection.…”
Section: Resultsmentioning
confidence: 99%
“…Figure 13A describes the process of EBL deposition for long-range nanopore channels: 1) Si 3 N 4 was deposited on the Si membrane; 2) the negative resist was used that the metallic apertures could be formed before etching in order to avoid that the metals exist on the walls in the wafer based on the previous report; 3) nanopore array was formed via ELB; then 4) the metal Au and metallic oxide layer (Al 2 O 3 ) as a protective layer were deposited by conventional electron gun heating before 5) resist lifts-off; then 6) dry etching for nanopore array. [95][96][97] On the other hand, the author proposed a new method, based on the report of Dahlin et al, that was polystyrene colloids assembling on the Si 3 N 4 membrane and then lifting the colloids after depositing Au and Al 2 O 3 layer, as illustrated in Figure 13B. [96,97] By this improved fabrication approach, it could avoid metal residues depositing on the dielectric membrane caused by the imperfect directionality of the nanopores.…”
Section: Hybrid Fabricationmentioning
confidence: 99%