In this paper we present a study of the structure, composition and optical properties of SiGe quantum dots, grown by gas-source molecular beam epitaxy on Si (001). Atomic force microscopy (AFM), transmission electron microscopy (TEM), scanning transmission electron microscopy (STEM), energy dispersive X-ray analysis (EDX), photoluminescence (PL) spectroscopy and decay time measurements of the quantum dots suggest that there are two distinct sizes of quantum dot, contributing two distinct emission bands in the PL spectra.
IntroductionThe growth of self-organised Ge quantum dots on Si has attracted a great deal of attention because of their potential application in Si based opto-electronic devices. Confinement of carriers in the quantum dots is expected to increase the luminescence efficiency [1, 2], due to the discrete nature of the confined states. Development of an efficient Si based light emitting material would make it possible to combine both optical and electronic components on the same Si substrate. Various methods of fabricating Ge quantum dots on Si substrates have been studied [3] but here we are concerned only with self organised quantum dots grown by molecular beam epitaxy (MBE). Two types of quantum dots have been commonly reported [4]: small pyramidal dots and larger domes. A broad photoluminescence (PL) band centred at % 0.8 eV, from Ge quantum dots has been reported [1, 5], but the nature of the recombination processes occurring therein is not completely understood. In order to accurately model the recombination processes detailed information about the composition and structure of the quantum dots is required.