Optical properties of thick metal nanohole arrays fabricated by electron‐beam and nanosphere lithography

Hajiaboli, Ahmad Reza; Cui, Bo; Kahrizi, Mojtaba; Truong, Vo‐Van

doi:10.1002/pssa.200881294

Cited by 18 publications

(12 citation statements)

References 15 publications

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“…This configuration brings a highly porous, high‐surface‐area, 3D‐interconnected morphology with optimized pore sizes. To fabricate such structures, top‐down methods of lithography‐related techniques, electrochemical etching, and laser‐induced etching have been reported. Bottom‐up methods such as electrochemical/electroless deposition, and additive manufacturing (i.e., 3D printing) can also be used.…”

Section: Discussionmentioning

confidence: 99%

3D Current Collectors for Lithium‐Ion Batteries: A Topical Review

2018

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Current collectors play important roles in enhancing the electrochemical performance of lithium‐ion batteries. Currently used collectors are mostly made of aluminum or copper foils through slurry casting with binders that have not reached optimal capacity. Furthermore, extended cycles of charge and discharge induce detachment of the cast layer, resulting in damage to the structural integrity. In order to better understand the principles of the performance of and thus optimize current collectors, a critical review is conducted focusing on their structures. Through analysis of data collected from more than 50 publications, the capacity and retention as a function of current density and charge cycle, respectively, are identified. Two new terms, which are characteristic of 3D current collectors, are defined as Regime I and Regime II in the corresponding plots. Regime I refers to the maximum reversible capacity and Regime II to the maximum capacitor retention. The greater the values of those values, the greater the enhancement of capacity and retention. Using these concepts, it is predicted that carbonaceous and fibrous 3D hierarchical current collectors would be beneficial as battery collectors. The results and approach provide perspective for future design and advancement of electrochemical energy‐storage devices.

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Section: Discussionmentioning

confidence: 99%

3D Current Collectors for Lithium‐Ion Batteries: A Topical Review

2018

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“…Positive resists are typically employed for liftoff; and if the metal to liftoff is too thick (e.g., >100 nm), a double layer stack, such as PMMA/P(MMA-MAA), 1 PMMA/LOR, 2 and high molecular weight PMMA/low molecular weight PMMA, 3 can be used to give an undercut profile that facilitates a clean liftoff. However, for lifting off some structures such as nanoscale trenches or holes, a negative resist is preferred as it offers far less exposure time than positive resist (yet a complicated double liftoff process can be utilized with a positive resist for such structures 4 ).…”

Section: Introductionmentioning

confidence: 99%

Lift-off with solvent for negative resist using low energy electron beam exposure

Dey

Cui

2014

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Lift-off and direct etch are the two most popular pattern transfer methods for electron beam lithography. For some applications negative resist would offer significantly less exposure time than positive one. Unfortunately, lift-off using negative resist is very challenging because the resist profile is typically positively tapered due to electron forward scattering, and upon exposure, negative resist is cross-linked and thus insoluble in solvents. Here, the authors will show that low energy exposure can circumvent both issues simultaneously, and the authors achieved liftoff of Cr with polystyrene resist using a solvent xylene. Moreover, low energy exposure offers proportionally higher resist sensitivity. Lastly, since low energy electrons are mostly stopped inside the resist layer, radiation damage to the sublayer is greatly reduced. Thus, the current method may be employed to fabricate metal nanostructures on top of an organic conducting layer.

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“…For some applications such as the fabrication of hole arrays in a film of Au, liftoff is the only option for pattern transfer since Au cannot be etched by reactive ion etching (RIE). Then negative resist would offer substantially shorter exposure time in the liftoff process, except when using a complicated 'resist tone reversal' process [1]. Bilenberg et al have selected four negative EBL resists and compared their performance: calixarene (Tokuyama Corp), ma-N 2401 (Microresist Technology), SU-8 (Microchem Corp) and mr-L 6000 (Microresist Technology) [2].…”

Section: Introductionmentioning

confidence: 99%

Effect of molecular weight distribution on e-beam exposure properties of polystyrene

Dey

Cui

2013

Nanotechnology

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Polystyrene is a negative electron beam resist whose exposure properties can be tuned simply by using different molecular weights (Mw). Most previous studies have used monodisperse polystyrene with a polydispersity index (PDI) of less than 1.1 in order to avoid any uncertainties. Here we show that despite the fact that polystyrene's sensitivity is inversely proportional to its Mw, no noticeable effect of very broad molecular weight distribution on sensitivity, contrast and achievable resolution is observed. It is thus unnecessary to use the costly monodisperse polystyrene for electron beam lithography. Since the polydispersity is unknown for general purpose polystyrene, we simulated a high PDI polystyrene by mixing in a 1:1 weight ratio two polystyrene samples with Mw of 170 and 900 kg mol(-1) for the high Mw range, and 2.5 and 13 kg mol(-1) for the low Mw range. The exposure property of the mixture resembles that of a monodisperse polystyrene with similar number averaged molecular weight Mn, which indicates that it is Mn rather than Mw (weight averaged molecular weight) that dominates the exposure properties of polystyrene resist. This also implies that polystyrene of a certain molecular weight can be simulated by a mixture of two polystyrenes having different molecular weights.

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Optical properties of thick metal nanohole arrays fabricated by electron‐beam and nanosphere lithography

Cited by 18 publications

References 15 publications

3D Current Collectors for Lithium‐Ion Batteries: A Topical Review

3D Current Collectors for Lithium‐Ion Batteries: A Topical Review

Lift-off with solvent for negative resist using low energy electron beam exposure

Effect of molecular weight distribution on e-beam exposure properties of polystyrene

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