“…4,20,21 With the ALD process, VO x thin lms have been grown using different metal, metal-organic, and metal-halide precursors as the source material for vanadium and H 2 O, H 2 O 2 , O 3 , molecular O 2 , and O 2 plasma as the oxidizing reactant. 4,14,17,[22][23][24] Among these, vanadyl triisopropoxide (VTIP; V 5+ ) is the most popular vanadium precursor used for the ALD growth process. 4 Conventional ALDgrown VO x thin lms are amorphous in nature, 25,26 except for limited cases where crystalline lms were successfully obtained.…”