2018
DOI: 10.7567/apex.11.036503
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Optical vortex beam direct-writing photolithography

Abstract: By using a focused unit-order vortex beam generated by a spiral phase plate, it is possible to acquire ∼100 nm structures in direct-writing photolithography. This novel method is simple and inexpensive and can quickly fabricate nanometer-size dams or trenches that may have applications in nanoscale waveguides or micro- and nanofluidics. To overcome the defect of a small exposure dose tolerance in this method, which may lead to poor quality of the direct-writing lines, an alternative solution using a fractional… Show more

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Cited by 9 publications
(5 citation statements)
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“…As noted initially, technological applications for structured light fields currently emerge, including e.g. photolithography 63 . In the context of such applications, trapped atoms may serve as precise probes with sub-wavelength resolution for mapping out the properties of the light fields, in order to characterize and improve optical instrumentation.…”
Section: Discussion and Outlookmentioning
confidence: 99%
“…As noted initially, technological applications for structured light fields currently emerge, including e.g. photolithography 63 . In the context of such applications, trapped atoms may serve as precise probes with sub-wavelength resolution for mapping out the properties of the light fields, in order to characterize and improve optical instrumentation.…”
Section: Discussion and Outlookmentioning
confidence: 99%
“…As noted initially, technological applications for structured light fields currently emerge, including e.g. photolithography Li et al [2018]. In the context of such applications, trapped atoms may serve as precise probes with sub-wavelength resolution for mapping out the properties of the light fields, in order to characterize and improve optical instrumentation.…”
Section: Discussion and Outlookmentioning
confidence: 99%
“…Since we know the initial incident light fields from section 2.1, it is not difficult to obtain this intensity distribution by solving the differential equations listed in section 2.2. However, we have to convert the 2D intensity distribution in the polar coordinates (w, j) to the 1D timevarying intensity distribution on a slice of the direct-writing line [35] before using the differential model. That means the incident light fields should be written as ( )…”
Section: The Dynamic Exposure Dose Integralmentioning
confidence: 99%