Singleâcrystal diamond substrates presenting a high concentration of negatively charged nitrogenâvacancy centers (NVâ) are on high demand for the development of optically pumped solidâstate sensors such as magnetometers, thermometers, or electrometers. While nitrogen impurities can be easily incorporated during crystal growth, the creation of vacancies requires further treatment. Electron irradiation and annealing is often chosen in this context, offering advantages with respect to irradiation by heavier particles that negatively affect the crystal lattice structure and consequently the NVâ optical and spin properties. A thorough investigation of electron irradiation possibilities is needed to optimize the process and improve the sensitivity of NVâbased sensors. In this work, the effect of electron irradiation is examined in a previously unexplored regime: extremely high energy electrons, at 155 MeV. A simulation model is developed to estimate the concentration of created vacancies and an increase of NVâ concentration by more than three orders of magnitude following irradiation of a nitrogenârich HPHT diamond over a very large sample volume is experimentally demonstrated, which translates into an important gain in sensitivity. Moreover, the impact of electron irradiation in this peculiar regime on other figures of merits relevant for NV sensing is discussed, including charge state conversion efficiency and spin relaxation time. Finally, the effect of extremely high energy irradiation is compared with the more conventional low energy irradiation process, employing 200 keV electrons from a transmission electron microscope, for different substrates and irradiation fluences, evidencing 60âfold higher yield of vacancy creation per electron at 155 MeV.