Results for long-wavelength emitters are presented for semi-polar InGaN/AlGaN/GaN heterostructures grown on GaN(1122)/m-sapphire templates by metalorganic chemical vapor deposition. The semi-polar GaN layers were 10 to 25 μm thick and grown by HVPE on sapphire substrates. X-ray diffraction measurements indicated high crystallographic quality that approaches that of GaN(0001) layers on sapphire. A comparison based on optical pumping experiments, low-and high-density excitation photoluminescence experiments, and atomic force microscopy is drawn between InGaN/GaN quantum well laser heterostructures grown by metalorganic vapor phase epitaxy either on either polar GaN(0001)/c-sapphire or on semi-polar GaN(1122)/m-sapphire. C-plane InGaN/GaN/sapphire structures exhibited low threshold pump power densities < 500 kW/cm 2 for emission wavelengths up to 450 nm. For laser structures beyond 450 nm the threshold pump power density rapidly increased resulting in a maximum lasing wavelength of 460 nm. Semipolar InGaN/GaN(1122)/m-sapphire structures showed a factor of 2-4 higher threshold pump power densities at wavelengths below 440 nm which is partly due to lower crystalline perfection of the semi-polar GaN/sapphire templates. However, at longer wavelengths > 460 nm the threshold power density for lasing of semi-polar heterostructures is less than that for c-plane heterostructures which enabled rapid progress to demonstration of lasing at 500 nm wavelength on semi-polar heterostructures. The absence of V-type defects in semi-polar, long-wavelength InGaN/GaN structures which are usually present in long-wavelength c-plane InGaN/GaN structures is attributed to this phenomenon.
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INTRODUCTIONInGaN/GaN-based light emitters such as LEDs and laser diodes (LD) cover the visible spectral range and therefore are applicable in numerous fields such as general lighting, automotive lighting, and projection displays. However, the efficiency of these devices needs to be further improved in order to realize the full energy-saving potential in such applications. In particular, LEDs and LDs emitting in the spectral range λ>480 nm suffer from lower internal quantum efficiencies compared to devices emitting in the 400-460 nm range.Among the many issues affecting device efficiency, the polarization fields along the polar c-axis of the wurtzite material and the low In incorporation efficiency into InGaN layers at high growth temperatures (T>800°C) are of particular importance. Polarization fields lead to electron-hole separation in quantum wells and thereby to a strong current-dependant emission wavelength shift, and the low In incorporation efficiency at higher growth temperatures affects material quality of InGaN quantum well layers [1,2]. Both issues have an increasingly negative impact on device performance as the emission wavelength increases in the visible spectral range. Therefore, much attention has been devoted to growth on non-polar and semi-polar GaN surfaces whereby polarization fields are reduced and In incorporation efficiency ...