2012
DOI: 10.1016/j.mee.2012.02.028
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Optimization of 3D patterning by Ga implantation and reactive ion etching (RIE) for nanoimprint lithography (NIL) stamp fabrication

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Cited by 11 publications
(14 citation statements)
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“…It uses the silicon dioxide based on the electron beam with polystyrene. For the complex 3D profile, FIB directly carves out the mask for NIL [ 149 , 150 , 151 ]…”
Section: Printing Methodsmentioning
confidence: 99%
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“…It uses the silicon dioxide based on the electron beam with polystyrene. For the complex 3D profile, FIB directly carves out the mask for NIL [ 149 , 150 , 151 ]…”
Section: Printing Methodsmentioning
confidence: 99%
“…It uses the silicon dioxide based on the electron beam with polystyrene. For the complex 3D profile, FIB directly carves out the mask for NIL [149][150][151] There have been several attempts to use NIL to create metamaterials over a large-area quickly [152,153]. Wu et al firstly developed a metasurface that worked at near-infrared wavelengths with L shaped components made using NIL.…”
Section: Curing Sourcementioning
confidence: 99%
“…One is the inkjet printing with the typical printers such as the NP 2.1 (GeSim, Germany) [50] and the Z402 (Zcorp, USA) [28]. The other is the nanoimprint lithography with the typical printers such as the EVG620 nanoimprinter [51] and the 520 hot embosser (EV Group, Austria) [52].…”
Section: Dpmentioning
confidence: 99%
“…Often the masters are made from silicon wafers using well-established silicon technology, like electron beam lithography or interference lithography combined with reactive ion etching [ 10 ], but also biological samples can be used to directly replicate bionic structures [ 4 , 25 ]. The fabrication of three-dimensional master stamps has also been achieved by focused ion beam related methods [ 26 , 27 ] or by grey scale lithography [ 28 ].…”
Section: Introductionmentioning
confidence: 99%