Optimization of a two-step Ni(5% Pt) germanosilicidation process and the redistribution of Pt in Ni(Pt)Si1−Ge germanosilicide

Impact of Al addition on the formation of Ni germanosilicide layers under different temperature annealing *

“…In recent years, the solid-phase reactions of Ni with Si 1−x Ge x have been studied in detail. [10][11][12] The NSG/Si 1−x Ge x contact properties could be improved by several methods, such as ions pre-implanted into Si 1−x Ge x , [13] introducing some other metal elements, [14][15][16] and different annealing processes. [17,18] Especially, Al incorporation is considered as a promising way to mediate the complex reactions between Ni and Si 1−x Ge x .…”