Epsilon-near-zero (ENZ) materials
have attracted great interest
due to their exotic linear and nonlinear responses, which makes it
significant to tune ENZ wavelengths for wavelength-dependent applications.
However, studies to achieve tunability in a wide spectral range and
link the fabrication parameters with linear and nonlinear ENZ properties
have been uncovered. ENZ indium tin oxide (ITO) nanofilms are fabricated
by magnetron sputtering, through which the control of ENZ properties
is demonstrated. Factors in the sputtering process, such as the gas
ratio and annealing, have a great impact on the ITO samples. Tunable
ENZ parameters are listed to provide a beneficial database for ENZ
ITO, mainly attributed to the change of carrier concentration. The
influence of ENZ parameters on optical characteristics via annealing
treatment is further explored. The ENZ wavelength is blue-shifted
by 609 nm, and the intrinsic loss is reduced by 63.2%, while the ITO
samples exhibit better linear scattering properties and stronger field
intensity enhancement. Additionally, the laser testing system illustrates
the change from reverse saturable absorption to saturable absorption
with an absolute modulation depth of 21.9%, improved by 222.1%, and
the nonlinear refractive index n
2 and
nonlinear absorption coefficient β are 2.07 × 10–16 m2 W–1 and −3.16 × 10–10 m W–1 for post-annealed ITO samples,
respectively. The proposed sputtering protocol offers a feasible technique
to control the linear and nonlinear ENZ performance, which has great
potential in laser technology and nanophotonics.