Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Chalykh, Roman; Kim, Seong-Sue; Woo, Sang Uk; Cho, Han-Ku; Moon, Joo-Tae

doi:10.1117/12.601142

Cited by 4 publications

(2 citation statements)

References 7 publications

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“…For simulation part, an in-house simulator, which is based on rigorous coupled wave analysis and Fourier optics method of high NA imaging, is used [3]. Basically, Maxwell's equation is solved by implementing RCWA for near field calculation, and far field calculation is following using high NA imaging algorithm [4].…”

Section: Methodsmentioning

confidence: 99%

Overlay metrology for dark hard mask process: simulation and experiment study

Shin¹,

Chalykh²,

Kang³

et al. 2007

SPIE Proceedings

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Simulation and experimental study results are reported to solve align/overlay problem in dark hard mask process in lithography. For simulation part, an in-house simulator, which is based on rigorous coupled wave analysis and Fourier optics method of high NA imaging, is used. According to the simulation and experiment study, image quality of alignment and overlay marks can be optimized by choosing hard mask and sub-film thickness carefully for a given process condition. In addition, it is important to keep the specification of film thickness uniformity within a certain limit. Simulation results are confirmed by experiment using the state of art memory process in Samsung semiconductor R&D facility.

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Section: Methodsmentioning

confidence: 99%

Overlay metrology for dark hard mask process: simulation and experiment study

Shin¹,

Chalykh²,

Kang³

et al. 2007

SPIE Proceedings

Self Cite

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“…Unfortunately, these equally segmented designs not only enhance the efficiency of the H-DLO but also magnify the efficiency of the DLZE. To avoid this, numerical simulation has been performed by using commercial software tools such as COMOSL to search for better structure parameters [18][19][20][21][22][23][24]. However, it is still very hard to find the overall optimal solution because the numerical method is quite sensitive to the initial conditions.…”

Section: Introductionmentioning

confidence: 99%

Analytic Design of Segmented Phase Grating for Optical Sensing in High-Precision Alignment System

Yang

Wang

et al. 2021

Sensors

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Ultra-precision measurement systems are important for semiconductor manufacturing processes. In a phase grating sensing alignment (PGA) system, the measurement accuracy largely depends on the intensity of the diffraction signal and its signal-to-noise ratio (SNR), both of which are associated with the grating structure. Although an equally segmented grating structure could increase the signal of a high odd order, it could also strengthen the signals at the zeroth and even orders which are the main contributors of stray light. This paper focuses on the practical problem of differently responding diffraction orders but in one grating structure. An analytical relationship has been established between the diffraction efficiency and the segment structure of phase grating. According to this analytic model, we then propose a design method to increase the diffraction signal at high odd orders and, meanwhile, to decrease it at the zeroth and even orders. The proposed method provides a fast and effective way to obtain the globally optimal grating structure in the valid scope. Furthermore, the design examples are also verified by means of numerical simulation tool–rigorous coupled-wave analysis (RCWA) software. As a result, the proposed method gives insight into the diffraction theory of segmented grating and the practical value to greatly improve the design efficiency.

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Dynamical Control of Multilayer Spacetime Structures Using Extended Fourier Modal Method

et al. 2021

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We introduce two-dimensional space plus time (2D+1) structure and numerically investigate it using a developed multilayer simulation framework, for the first time. The new structure is consisting of crossed grating with time-varying permittivity which is inspired from 1D+1. In this regard, we extend Fourier Modal Method (FMM) in a general approach for spacetime multilayer states. Our proposed framework is fast, robust, and powerful compared to various finite difference methods. We use the scattering matrix technique to develop the proposed spacetime simulation method for multilayer structures using a non-uniform stack of layers. The method is perfectly suitable to investigate the spatiotemporal effects of surfaces/metasurfaces which covers both the transverse electric and magnetic (TE & TM) polarizations. The results show more freedom to control the optical outcomes of the multilayer considering two spatial periodicities in addition to the modulation frequency to reach nonreciprocity as one of the main consequences of the proposed structure. Moreover, we investigate the condition and limitation of breaking the Lorentz rule for spacetime structures. 2D+1 structure is more controllable than the 1D+1 due to its greater ability to adjust spatial manipulation in addition to temporal variations to reach nonreciprocity applications, digital coding, beam steering, etc.

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Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Cited by 4 publications

References 7 publications

Overlay metrology for dark hard mask process: simulation and experiment study

Overlay metrology for dark hard mask process: simulation and experiment study

Analytic Design of Segmented Phase Grating for Optical Sensing in High-Precision Alignment System

Dynamical Control of Multilayer Spacetime Structures Using Extended Fourier Modal Method

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