Optimization of <i>in situ</i> substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics

Schönjahn, C.; Ehiasarian, Arutiun P.; Lewis, D.B.; New, R.; Münz, W.‐D.; Twesten, R. D.; Petrov, I.

doi:10.1116/1.1349726

Cited by 33 publications

(15 citation statements)

References 18 publications

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“…From TRIM calculations using an acceleration of 1.2 keV and an average charge state as given in Section 3.1, the estimated maximum projected range R = 2.5 nm and the straggle S = 0.9 nm for Ar 2+ and Cr 2+ gives a ballistic intermixing length (R + S) of 3.4 nm. With STEM-EDX a significant Cr signal can The intermixing depth for the Cr is in good agreement with the results found for arc-etching where the Cr incorporation was measured to reach a depth up to about 15 nm [7].…”

Section: Substrate-film Interface Investigationssupporting

confidence: 77%

“…Besides its inefficient etching rate of oxides, the incorporation of a high concentration of Ar gas in the interface is disadvantageous. Consequently, the critical load L c of failure values in scratch tests are rather low (L c < 40 N) [7]. …”

Section: Discussionmentioning

confidence: 99%

“…Therefore, interface engineering is an important issue demanding ions for surface cleaning and modification [4][5][6][7]. The cleaned and/or modified surface due to pretreatment was given to increase the bonding strength and with a well-preserved crystalline structure to promote local epitaxial growth maximizing the interfacial adhesion of thin films.…”

Section: Introductionmentioning

confidence: 99%

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Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel

Lattemann

Ehiasarian

Böhlmark

et al. 2006

Surface and Coatings Technology

143

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In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel high power impulse magnetron sputtering (HIPIMS) technique followed by reactive unbalanced d.c. magnetron sputtering deposition was performed using a Cr target. The HIPIMS plasma comprising a high metal ion-to-neutral ratio consisting of single-and doublecharged metal species identified by mass spectrometry increased the metal ion flux to the substrate. When applying a negative substrate bias U b the adhesion was enhanced due to sputter cleaning of the surface and metal ion intermixing in the interface region. This intermixing, resulting in a gradual change of the composition, is considered to enhance the adhesion of the hard coatings on steel substrates. The pretreatment was carried out in an inert gas atmosphere at a pressure of p Ar = 1 mTorr, the duration was varied between 25 and 75 min, whereas the negative substrate bias was varied between 400 V and 1200 V. The adhesion was found to depend on the substrate bias as well as on the target power and, for low substrate bias, on the duration of the pretreatment. For CrN the critical load of failure determined by scratch test could be increased in comparison to the values reported for specimens pretreated by conventional Ar etching. The influence of the target peak voltage, the substrate bias as well as pretreatment time on the constitution and morphology of the interface after the pretreatment is discussed applying analytical transmission electron microscopy.

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Section: Substrate-film Interface Investigationssupporting

confidence: 77%

Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel

Lattemann

Ehiasarian

Böhlmark

et al. 2006

Surface and Coatings Technology

143

View full text Add to dashboard Cite

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“…For instance, Schönjahn et al studied Cr arc etching of M2 mild steel, where an implantation/diffusion layer of Cr in the steel was observed at DC bias voltages of -800 to -1200V [30].…”

Section: Sputter Cleaning By Gas Ions: DC Biasingmentioning

confidence: 99%

Industrial-scale deposition of highly adherent CNx films on steel substrates

Broitman

Czigány

Greczyński

et al. 2010

Surface and Coatings Technology

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Highly adherent carbon nitride (CN x ) films were deposited using a novel pretreatment with two high power impulse magnetron sputtering (HIPIMS) power supplies in a master-slave configuration: one to establish the discharge and one to produce a pulsed substrate bias. During the pretreatment, SKF3 (AISI 52100) steel substrates were pulse-biased in the environment of a HIPIMS Cr plasma in order to sputter clean the surface and to implant Cr metal ions. Subsequently, CN x films were prepared at room temperature by DC unbalanced magnetron sputtering from a high purity graphite target in a N 2 /Ar discharge at 3 mTorr. All processing was done in an industrial CemeCon CC800 system. A series of

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“…Similarly, a boron-doped graded layer diamond coating, acting as a transition layer between a non-graded boron-doped diamond coating and a nano-crystalline diamond coating, was studied in order to improve the machining performance of tungsten carbide cutting tools [104]. Other complex coating structures which take advantage of the gradient composition can be realized by different combinations of multiple layers, as in [193], where a layered coating was made of a lower fine periodic TiAlYN/CrN multilayer that graded into an upper amorphous TiAlY oxynitride layer in order to obtain enhanced oxidation resistance and reduced friction coefficient in tungsten carbide tools for high-speed cutting applications.…”

Section: Multi-layered and Graded Coatingsmentioning

confidence: 99%

The Critical Raw Materials in Cutting Tools for Machining Applications: A Review

et al. 2020

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A variety of cutting tool materials are used for the contact mode mechanical machining of components under extreme conditions of stress, temperature and/or corrosion, including operations such as drilling, milling turning and so on. These demanding conditions impose a seriously high strain rate (an order of magnitude higher than forming), and this limits the useful life of cutting tools, especially single-point cutting tools. Tungsten carbide is the most popularly used cutting tool material, and unfortunately its main ingredients of W and Co are at high risk in terms of material supply and are listed among critical raw materials (CRMs) for EU, for which sustainable use should be addressed. This paper highlights the evolution and the trend of use of CRMs) in cutting tools for mechanical machining through a timely review. The focus of this review and its motivation was driven by the four following themes: (i) the discussion of newly emerging hybrid machining processes offering performance enhancements and longevity in terms of tool life (laser and cryogenic incorporation); (ii) the development and synthesis of new CRM substitutes to minimise the use of tungsten; (iii) the improvement of the recycling of worn tools; and (iv) the accelerated use of modelling and simulation to design long-lasting tools in the Industry-4.0 framework, circular economy and cyber secure manufacturing. It may be noted that the scope of this paper is not to represent a completely exhaustive document concerning cutting tools for mechanical processing, but to raise awareness and pave the way for innovative thinking on the use of critical materials in mechanical processing tools with the aim of developing smart, timely control strategies and mitigation measures to suppress the use of CRMs.

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Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics

Cited by 33 publications

References 18 publications

Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel

Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel

Industrial-scale deposition of highly adherent CNx films on steel substrates

The Critical Raw Materials in Cutting Tools for Machining Applications: A Review

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