Abstract:Effects of RF power on optical, electrical, and structural properties ofμc-Si1−xGex:H films was reported. Raman and FTIR spectra fromμc-Si1−xGex:H films reflected the variation in microstructure and bonding configuration. Unlike increasing the germane concentration for Ge incorporation, low RF power enhanced Ge incorporation efficiency inμc-Si1−xGex:H alloy. By decreasing RF power from 100 to 50 W at a fixed reactant gas ratio, the optical bandgap ofμc-Si1−xGex:H was reduced owing to the increase in Ge content… Show more
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