2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) 2012
DOI: 10.1109/smelec.2012.6417127
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Optimization of process parameter variation in 45nm p-channel MOSFET using L<inf>18</inf> orthogonal array

Abstract: In this study, orthogonal array of L 18 in Taguchi method was used to optimize the process parameters variance on threshold voltage (V TH ) in 45nm p-channel Metal Oxide Semiconductor Field Effect Transistor (MOSFET) device. The signal-to-noise (S/N) ratio and analysis of variance (ANOVA) are employed to study the performance characteristics of the PMOS device. There are eight process parameters (control factors) were varied for 2 and 3 levels to performed 18 experiments. Whereas, the two noise factors were va… Show more

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Cited by 6 publications
(5 citation statements)
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“…[ 38–42 ] Slight deviations in processing parameters, such as temperature, pressure, or duration of deposition or annealing steps, can lead to variations in the formation and properties of the synaptic devices. [ 43–45 ] The effect of the device‐to‐device variation in the fabricated synaptic FeFETs on the performance of the proposed in‐memory RL system is investigated. The device‐to‐device variation is expressed as follows [ 46,47 ] Greal=Gideal×N(1,σ2)$$G_{r e a l} = G_{i d e a l} \times N \left(\right.…”
Section: Resultsmentioning
confidence: 99%
“…[ 38–42 ] Slight deviations in processing parameters, such as temperature, pressure, or duration of deposition or annealing steps, can lead to variations in the formation and properties of the synaptic devices. [ 43–45 ] The effect of the device‐to‐device variation in the fabricated synaptic FeFETs on the performance of the proposed in‐memory RL system is investigated. The device‐to‐device variation is expressed as follows [ 46,47 ] Greal=Gideal×N(1,σ2)$$G_{r e a l} = G_{i d e a l} \times N \left(\right.…”
Section: Resultsmentioning
confidence: 99%
“…For each rate sensor, the interval is configurable in 100 ms granularity. To further expand the previous example, we will use the methodology of [167] and [128] and integrate it in our example adaptive voltage controller. The authors of [167] and [128] show how cache memories introduce faulty SRAM cells as they operate in low supply voltage.…”
Section: Safe-mode and Notification On Critical Sensor Valuesmentioning
confidence: 99%
“…To further expand the previous example, we will use the methodology of [167] and [128] and integrate it in our example adaptive voltage controller. The authors of [167] and [128] show how cache memories introduce faulty SRAM cells as they operate in low supply voltage. The rate of these faults (and corresponding rate of ECC events) can be used to drive the level of undervolting.…”
Section: Safe-mode and Notification On Critical Sensor Valuesmentioning
confidence: 99%
“…During chip fabrication, process variations can affect transistor dimensions (length, width, oxide thickness etc. [125]) which have direct impact on the threshold voltage of a MOS device [126]. As technology scales, the percentage of these variations compared to the overall transistor size increases and raises major concerns for designers, who aim to improve energy efficiency.…”
Section: Statistical Analysis To Predict the Safe Voltage Margins In Multicore Cpus For Energy Efficiencymentioning
confidence: 99%