2024
DOI: 10.1088/1361-6668/ad921a
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Optimization of superconducting niobium nitride thin films via high-power impulse magnetron sputtering

Hudson T Horne,
Collin M Hugo,
Brandon C Reid
et al.

Abstract: We report a systematic comparison of niobium nitride thin films deposited on oxidized silicon substrates by reactive DC magnetron sputtering and reactive high-power impulse magnetron sputtering (HiPIMS). After determining the nitrogen gas concentration that produces the highest superconducting critical temperature for each process, we characterize the dependence of the critical temperature on film thickness. The optimal nitrogen concentration is higher for HiPIMS than for DC sputtering, and HiPIMS produces hig… Show more

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