Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores

Nazmov, V.; Goldenberg, B. G.; Vasiliev, A. B.; Асадчиков, В. Е.

doi:10.1088/1361-6439/abf331

Cited by 8 publications

(2 citation statements)

References 43 publications

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“…Был проведен синтез регулярных металлических поверхностных острийных структур с использованием пористых полимерных пленок. Диаметр пор и их глубина определялись условиями облучения полимера через титановую матрицу с периодическим рельефом [3]. Использовались полимерные пленки из полиэтилентерефталата (ПЭТФ) толщиной 10 µm.…”

Section: поступило в редакцию 18 ноября 2021 г в окончательной редакции 20 декабря 2021 г принято к публикации 20 декабря 2021 гunclassified

Получение Регулярных Металлических И Диэлектрических Микроструктур На Основе Модифицированных При Облучении Полимерных Пленок

Асадчиков¹,

Bedin²,

Березкин³

et al. 2022

Письма В Журнал Технической Физики

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Based on regular porous polymeric membranes, the synthesis of metallic and dielectric spearhead structures with given morphological characteristics was carried out. Copper structures with 1 μm height and dielectric spearhead microstructures made of iodoic acid with 12 μm height and 1 μm diameter of were obtained. The possibility of using such optical elements to solve the problems of increasing the efficiency of IR radiation detection, signal amplification and conversion to visible and near-infrared ranges.

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Получение Регулярных Металлических И Диэлектрических Микроструктур На Основе Модифицированных При Облучении Полимерных Пленок

Асадчиков¹,

Bedin²,

Березкин³

et al. 2022

Письма В Журнал Технической Физики

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“…Although the X-ray LIGA process results in high aspect ratio structures 39 , the method requires specialized X-ray sources with highly specific beam characteristics. Moreover, fabrication of large-area gratings in X-ray LIGA is challenging due to the limited size of the X-ray beam—typical device area fabricated in X-ray LIGA is less than4-inch square 40 , 41 . On the other hand, conventional UV-LIGA 42 is unable to obtain the high aspect ratios of X-ray LIGA because of the drawbacks of UV lithography, i.e., the diffraction of UV light as it travels away from the photomask into the resist.…”

Section: Introductionmentioning

confidence: 99%

Self-aligned multi-layer X-ray absorption grating using large-area fabrication methods for X-ray phase-contrast imaging

Pil-Ali

Adnani

Karim

2023

Sci Rep

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X-ray phase-contrast (XPCi) imaging methods are an emerging medical imaging approach that provide significantly better soft tissue contrast and could function as a viable extension to conventional X-ray, CT, and even some MRI. Absorption gratings play a central role in grating-based XPCi systems, especially because they enable the acquisition of three images in a single exposure: transmission, refraction, and dark-field. An impediment to commercial development and adoption of XPCi imaging systems is the lack of large area, high aspect ratio absorption gratings. Grating technology development, primarily due to technological limitations, has lagged system development and today prevents the scaling up of XPCi system into a footprint and price point acceptable to the medical market. In this work, we report on a self-aligned multi-layer grating fabrication process that can enable large-area X-ray absorption gratings with micron-scale feature sizes. We leverage large-area fabrication techniques commonly employed by the thin-film transistor (TFT) display industry. Conventional ITO-on-glass substrates are used with a patterned film of Cr/Au/Cr that serves as a self-aligned lithography mask for backside exposure. Commonly available SU-8 photoresist is patterned using the backside exposure mask followed by an electroplating step to fill the gaps in the SU-8 with X-ray attenuating material. Consequently, the electroplated patterned material acts as a self-aligned photomask for subsequent SU-8 layer patterning and so forth. The repeatability of the reported process makes it suitable for achieving higher aspect ratio structures and is advantageous over previously reported X-ray LIGA approaches. A prototype three-layer grating, with a thickness of around $$40\,\upmu \text{m}$$ 40 μ m , having a visibility of 0.28 at $$60\,\text{kV}_p$$ 60 kV p with a $$70\,\text{mm}\times 70\,\text{mm}$$ 70 mm × 70 mm active area was fabricated on a 4-inch glass substrate and demonstrated by modifying a commercially available 3D propagation-based XPCi Microscope. The scalable and cost-effective approach to build larger area X-ray gratings reported in this work can help expedite the commercial development and adoption of previously reported Talbot-Lau, speckle-tracking, as well as coded-aperture XPCi systems for large-area clinical and industrial applications.

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Methods for the Formation of Regular Porous Structures in Polyethylene-Terephthalate Films

et al. 2021

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Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores

Cited by 8 publications

References 43 publications

Получение Регулярных Металлических И Диэлектрических Микроструктур На Основе Модифицированных При Облучении Полимерных Пленок

Получение Регулярных Металлических И Диэлектрических Микроструктур На Основе Модифицированных При Облучении Полимерных Пленок

Self-aligned multi-layer X-ray absorption grating using large-area fabrication methods for X-ray phase-contrast imaging

Methods for the Formation of Regular Porous Structures in Polyethylene-Terephthalate Films

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