In this Letter, high-uniformity 1 × 64 linear arrays of 4H-SiC avalanche photodiode (APD) are reported for ultraviolet detection. Multi-cycle inductively coupled plasma dry etching was adopted for the bevelled mesa formation, during which the wafers were rotated with a small angle for each cycle to suppress the process variation. As a result, a high pixel yield of 100% and a high-uniformity breakdown voltage with a fluctuation of smaller than 0.5 V are achieved for the fabricated 1 × 64 4H-SiC APD linear arrays, which is a great improvement for 4H-SiC APD arrays. Moreover, the dark currents at 95% of breakdown voltage are below 1 nA for all the 64 pixels. Besides, the pixels in the array show a multiplication gain of larger than 10 6 and a peak responsivity of 0.12 A/W at 285 nm (corresponding to a maximum quantum efficiency of 52%) at room temperature.