Optimizing a cleaning process for multilayer-dielectric- (MLD) diffraction gratings

Ashe, B.; Giacofei, C.; Myhre, Graham; Schmid, A. W.

doi:10.1117/12.751750

Cited by 21 publications

(17 citation statements)

References 5 publications

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“…Ashe et al [11,12] were among the first to publish on this topic. They compared a number of chemical wet-cleaning methods commonly used in the semiconductor industry.…”

Section: Mld Grating Cleaningmentioning

confidence: 99%

“…Thresholds exceeding 2.7 J∕cm 2 have been reported for 10 ps testing [11,12,19,20,23,24], but in some of these studies the incidence angle was higher than 61°(necessitating a correction for comparison [25]), and in other cases damage-testing data were reported for only an air (or unspecified) environment. OMEGA EP gratings are operated in high vacuum.…”

Section: Mld Grating Cleaningmentioning

confidence: 99%

“…Since many grating manufacturers do not use BARC, little information is available on stripping it from MLD gratings during final cleaning. Finally, wet cleaning of MLD gratings has typically been performed at high temperatures (60°C-110°C), especially when acid piranha is used to strip photoresist [11][12][13][14]. Such elevated processing temperatures have recently raised concerns about thermal-stress-induced defects, such as blistering and localized coating delamination, that can occur during cleaning.…”

Section: Mld Grating Cleaningmentioning

confidence: 99%

“…Surface contamination can dramatically reduce a grating's resistance to laser-induced damage [5,[8][9][10][11][12][13][14][15]. OMEGA EP pulse compressor gratings are fabricated by etching a periodic groove structure (1740 lines∕mm) into the top layer of a hafnia/silica multilayer mirror using interference lithography.…”

Section: Introductionmentioning

confidence: 99%

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Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning

et al. 2013

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A low-temperature chemical cleaning approach has been developed to improve the performance of multilayer dielectric pulse-compressor gratings for use in the OMEGA EP laser system. X-ray photoelectron spectroscopy results guided the selection of targeted cleaning steps to strip specific families of manufacturing residues without damaging the grating's fragile 3D profile. Grating coupons that were cleaned using the optimized method consistently met OMEGA EP requirements on diffraction efficiency and 1054 nm laser-damage resistance at 10 ps. The disappearance of laser-conditioning effects for the highest-damage-threshold samples suggests a transition from a contamination-driven laser-damage mechanism to defect-driven damage for well-cleaned components.

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“…Ashe et al [11,12] were among the first to publish on this topic. They compared a number of chemical wet-cleaning methods commonly used in the semiconductor industry.…”

Section: Mld Grating Cleaningmentioning

confidence: 99%

Section: Mld Grating Cleaningmentioning

confidence: 99%

Section: Mld Grating Cleaningmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning

et al. 2013

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“…Ashe [5] had described that the Piranha solution which is a mixture of a strong acid and a strong oxidizing agent was used to remove the residues on the surface of gratings at high temperature. [6] 5th International Symposium on Advanced Optical Manufacturing and The result shows that the high LIDT was greater than 2.7 J/cm 2 at 1053nm with 10-ps pulse length (for both 1-on-1 and N-on-1).…”

Section: Introductionmentioning

confidence: 99%

Wet-cleaning of contaminants on the surface of multilayer dielectric pulse compressor gratings by the Piranha solution

Chen

Sheng

et al. 2010

SPIE Proceedings

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Contaminants are deemed to be the initial source of optical-damage mechanisms as well as the main reason to decrease the Laser Induced Damage Threshold (LIDT) of multilayer dielectric pulse compressor gratings (PCG). In this paper, the Piranha solution was used effectively and nondestructively to remove the residual contaminants on the surface of PCG. The surface cleanliness was evaluated by Scanning Electron Microscopy (SEM) and X-ray Photoelectron Spectroscopy (XPS).The higher removal efficiency was achieved with more times of multiple-cleaning by fresh Piranha solution which has an effectiveness for a given period of time.

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Nanosecond laser conditioning of multilayer dielectric gratings for picosecond–petawatt laser systems

Shuai,

Zhao,

Liu

et al. 2023

High Pow Laser Sci Eng

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Multilayer dielectric gratings (MLDGs) are crucial for pulse compression in picosecond-petawatt laser systems. Bulged nodular defects, embedded in coating stacks during multilayer deposition, influence the lithographic process and performance of the final MLDG products. In this study, the integration of nanosecond laser conditioning (NLC) into different manufacturing stages of MLDGs was proposed for the first time on multilayer dielectric films (MLDFs) and final grating products to improve laser-induced damage performance. The results suggest that the remaining nodular ejection pits introduced by the two protocols exhibit a high nanosecond laser damage resistance, which remains stable when the irradiated laser fluence is more than twice the nanosecond-laser-induced damage threshold (nanosecond-LIDT) of the unconditioned MLDGs. Furthermore, the picosecond-LIDT of the nodular ejection pit conditioned on the MLDFs was approximately 40% higher than that of the nodular defects, and the loss of the grating structure surrounding the nodular defects was avoided. Therefore, NLC is an effective strategy for improving the laser damage resistance of MLDGs.

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Optimizing a cleaning process for multilayer-dielectric- (MLD) diffraction gratings

Cited by 21 publications

References 5 publications

Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning

Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning

Wet-cleaning of contaminants on the surface of multilayer dielectric pulse compressor gratings by the Piranha solution

Nanosecond laser conditioning of multilayer dielectric gratings for picosecond–petawatt laser systems

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