A fused-silica three-port grating under TE-polarized normal incidence
is designed and manufactured with improved diffraction efficiency (DE)
and bandwidth. A physical explanation of the grating diffraction is
provided using the simplified mode method (SMM), and parameters of the
grating structure were optimized using rigorous coupled-wave analysis
(RCWA). For a given set of optimized parameters, a transmitted
three-port grating with an area of 170mm×170mm was fabricated by scanning beam
interference lithography (SBIL), and diffraction properties were
investigated. The average DEs for the +1, 0, and 1 orders of the 25 sampling
points are 29%, 30%, and 31% at a 632.8 nm incident wavelength.
Additionally, the measured DEs of the +1, 0, and 1 orders all exceed 25% at
the wavelength range from 613 to 653 nm.