Optimizing capacity allocation in semiconductor manufacturing photolithography area – Case study: Robert Bosch

Recent Developments of TiO2-Based Photocatalysis in the Hydrogen Evolution and Photodegradation: A Review

“…Photocatalytic activity directly depends on the number of active centers on the surface of the photocatalyst. Photolithography is a block of technological processes of photochemical technology aimed at creating the relief in the film, as well as a film of metal deposited on a substrate [ 87 , 88 ]. Using this method, a group of scientists [ 89 ] managed to obtain TiO 2 films with lattice, square, and hexagonal structures ( Figure 8 ) and investigate the influence of a such surface textures on the photocatalysis.…”

Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography

“…[1][2][3][4][5] With the introduction of DUV and advances in lithography techniques (e.g., ArF immersion), the IC feature size has continued to decrease until recently. [6,7] The most advanced semiconductor processes demand sub-nanometer nodes in the nanoelectronics industry, and the previous generation of 193 nm ArFimmersion lithography processes cannot satisfy this requirement. [7,8] Accordingly, in recent years, the extreme ultraviolet (EUV, 13.5 nm) lithography has been introduced and will continue to be used.…”

Photoactive Nanomaterials

“…Various WO 3 nanomaterials with different morphologies including nanorods [86], nanoflake [87], nanotubes [88,89], nanoplates [90] and nanoparticles [91,92] were synthesized by various methods to provide active sites for catalysis. It was found that morphology change of WO 3 can significantly influence photocatalytic activity.…”

“…They concluded [93,94] that uniform platelike morphology is favorable for gas sensing because it has more active sides for absorption of gas molecules. In addition, much work was done on WO 3 crystal growth using fluoroboric acid [95], polyethylene glycol (PEG) [96], polyvinyl alcohol (PVA) [87].…”

“…However, some authors believed that 2D nanostructures like nanoplates have higher specific surface area than one-dimensional (1D) materials such as nanorods and nanowires. For example, Su and others demonstrated better photoelectrochemical characteristics and optical properties of WO 3 nanoflakes than WO 3 nanorods [87]. Hammad et al [103] fabricated WO 3 nanorods (with a diameter 7 nm, length up to 700 nm) and WO 3 nanoplates with width 700 nm on fluorine-doped tin oxide (FTO) substrate via hydrothermal treatment.…”