2005
DOI: 10.1143/jjap.44.1427
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Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure

Abstract: NO in N 2 gas was removed by injecting ammonia radicals, which were externally generated by flowing NH 3 gas diluted with Ar gas through a dielectric barrier discharge (DBD) with a one-cycle sinusoidal-wave power source. The discharge was intermittently formed between coaxial cylindrical electrodes at an applied peak-to-peak voltage of 2-15 kV. The generated radicals were introduced in a reaction chamber and reacted with NO. In order to find optimum parameters for NO reduction and energy efficiency, the reacti… Show more

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Cited by 8 publications
(3 citation statements)
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“…Second, NO is removed without oxygen gas in NO gases, and when oxygen gas is included in NO gas, NO removal characteristics are not dependent on the oxygen concentration from 5% through 15%. Third, the present system has a wide temperature range of NO removal [14]. Fourth, the present system is performed by a low power consumption in the plasma.…”
Section: B Effect Of Consumed Power In the Radicalmentioning
confidence: 98%
“…Second, NO is removed without oxygen gas in NO gases, and when oxygen gas is included in NO gas, NO removal characteristics are not dependent on the oxygen concentration from 5% through 15%. Third, the present system has a wide temperature range of NO removal [14]. Fourth, the present system is performed by a low power consumption in the plasma.…”
Section: B Effect Of Consumed Power In the Radicalmentioning
confidence: 98%
“…It's desirable to install the SNCR equipment to incinerators, but temperature of the flue gas is around 750 ºC, therefore it is impossible to apply the incinerators. We have been developed an original SNCR using dielectric barrier discharge (2,3) . The advantages of the SNCR system are low temperature reaction.…”
Section: Introductionmentioning
confidence: 99%
“…大気圧プラズマ励起と同等の脱硝性能を得られることを確認した (6) VUV 反応器は,内径 80 mm,長さ 105 mm のアルミ製円筒型反応器の中心部に,Xe ガス封入誘電体バリア放電方 式のエキシマランプ(USHIO Inc., 直径 40 mm の円筒型,ランプ出力 26 mW cm− 2 ) )を配置した構造である (6) .NH 3 ガスは, ランプ表面とカバー内面の隙間 (20 mm) を反応器下部から上部に流れる. ガス流路の容積は 377 cm 3 である.…”
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