1999
DOI: 10.1063/1.369679
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Optoelectronic and structural properties of amorphous silicon–carbon alloys deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition

Abstract: The optoelectronic and structural properties of hydrogenated amorphous silicon-carbon alloys ͑a-SiC:H͒ are studied over the entire compositional range of carbon content. The films are prepared using low-power electron-cyclotron resonance ͑ECR͒ plasma-enhanced chemical vapor deposition. The carbon content was varied by using different methane ͑or ethylene-͒-to-silane gas phase ratios and by introducing the methane ͑or ethylene͒ either remotely into the plasma stream or directly through the ECR source, together … Show more

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Cited by 77 publications
(30 citation statements)
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“…The subnanosecond decay times (s I ), due to both radiative and non-radiative recombination mechanisms, are in quantitative agreement with previous studies of amorphous carbon ®lms [11]. A similar dependence of intrinsic decay times on E em has been reported in C-rich silicon carbon alloys [10].…”
Section: Resultssupporting
confidence: 78%
See 1 more Smart Citation
“…The subnanosecond decay times (s I ), due to both radiative and non-radiative recombination mechanisms, are in quantitative agreement with previous studies of amorphous carbon ®lms [11]. A similar dependence of intrinsic decay times on E em has been reported in C-rich silicon carbon alloys [10].…”
Section: Resultssupporting
confidence: 78%
“…Intensity decays have been ®tted using a convolution between the laser excitation and an intrinsic decay function made of the sum of three exponentials (six parameter ®t) [9]. This empirical analytic function is found to describe accurately the PL decays in a-C:H ®lms and silicon±carbon alloys [10]. The intrinsic decay times s I ) of PL intensity, obtained from a weighted average of the ®tted decay times, decrease from 965 to 39 ps as a function of increasing E em ( Table 1).…”
Section: Methodsmentioning
confidence: 99%
“…The peak near 1000 cm À1 represents the wagging mode C-H 2 bond within SiCH 2 , and its integrated intensity increases with increasing plasma power density and with decreasing substrate temperature. The weak peaks near 1250, 2000-2200, 2890, 2960 cm À1 correspond to bending mode Si-CH 3 , stretching mode Si-H n (n ¼ 1; 2), and stretching mode C-H 2 and C-H 3 , respectively [14,[17][18][19][20]. All include hydrogen, and the intensity of the peaks decreases with increasing substrate temperature.…”
Section: Ftir Spectramentioning
confidence: 93%
“…Infrared spectroscopy can be used to determine the content of chemical bonds, including hydrogen bonds [11][12][13][14][15][16], based on the integrated absorption intensity of stretching mode bonds. Si-H n (n ¼ 1; 2), C-H 2, C-H 3 and Si-C bonds are observed as peaks at 2000-2200, 2890, 2960 and 790 cm À1 , respectively [14,[17][18][19][20]. The absorption cross-section and film thickness are also required for this calculation, obtained from Ref.…”
Section: Introductionmentioning
confidence: 98%
“…polymer foil). (2) The bandgap of the material can be controlled by doping it with carbon (a-Sii_^C^:H) [46]. Increasing concentration of carbon (x) in the alloy widens the bandgap, allowing it to be tuned from a minimum value of about 1.75 eV (x = 0) to 3 eV (x = 1).…”
Section: Absorption From Mnp Near-field In Amorphous Silicon Mediummentioning
confidence: 99%