“…The peak near 1000 cm À1 represents the wagging mode C-H 2 bond within SiCH 2 , and its integrated intensity increases with increasing plasma power density and with decreasing substrate temperature. The weak peaks near 1250, 2000-2200, 2890, 2960 cm À1 correspond to bending mode Si-CH 3 , stretching mode Si-H n (n ¼ 1; 2), and stretching mode C-H 2 and C-H 3 , respectively [14,[17][18][19][20]. All include hydrogen, and the intensity of the peaks decreases with increasing substrate temperature.…”