1993
DOI: 10.1016/0921-5107(93)90224-b
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Optoelectronic applications of LTMBE III–V materials

Abstract: A review of the application of semiconductor layers grown at low substrate temperatures to ultrafast optoelectronics is presented. The films, grown by molecular beam epitaxy primarily around 200 °C and subsequently annealed, are demonstrated to have high resistivity, high mobility, an ultrashort carrier lifetime, and a high dielectric breakdown. This combination of properties makes the low-temperature-grown materials perfectly suited for use in high-speed optoelectronic devices. A number of issues which influe… Show more

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Cited by 69 publications
(17 citation statements)
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“…This is the growth parameter regime of the so-called low temperature grown (LTG) GaAs, which has the potential for designing devices with special properties like extremely high resistivity, very short carrier lifetimes and a large electro-optic effect [14,15]. Recently LTG GaAs has gained additional interest due to the possibility to include high concentrations of magnetic impurities in the lattice, and the discovery of carrier-mediated ferromagnetism in these materials, which can be grown by using the GaAs(0 0 1)-c(4 Â 4) surface as a starting point [16,17].…”
Section: C(4 â 4)mentioning
confidence: 99%
See 1 more Smart Citation
“…This is the growth parameter regime of the so-called low temperature grown (LTG) GaAs, which has the potential for designing devices with special properties like extremely high resistivity, very short carrier lifetimes and a large electro-optic effect [14,15]. Recently LTG GaAs has gained additional interest due to the possibility to include high concentrations of magnetic impurities in the lattice, and the discovery of carrier-mediated ferromagnetism in these materials, which can be grown by using the GaAs(0 0 1)-c(4 Â 4) surface as a starting point [16,17].…”
Section: C(4 â 4)mentioning
confidence: 99%
“…Growth of high-quality crystals for optoelectronic devices occurs in the 2 Â 4 phase around 580-600 C. Low temperature grown (LTG) GaAs is grown on the c(4 Â 4) reconstruction between 200 and 300 C which is used in a variety of exotic applications such as transition metal doped GaAs for ''spintronic'' applications, or extremely high resistivity and very short carrier lifetime applications [14][15][16][17]. The changes in reconstruction occur because the chemical potential of the two species are changing Reprinted with permission from [18].…”
Section: Surface Phase Diagrammentioning
confidence: 99%
“…Most commonly used switches are based on an epitaxial GaAs layers grown by molecular-beam-epitaxy (MBE) technique at relatively low (200°C to 300°C) substrate temperatures and afterwards annealed at 600°C or higher temperatures [1,2]. Besides the unique set of parameters -a Recently, several types of femtosecond solid-state and fiber lasers emitting at the near infrared wavelengths between 1 and 1.55 μm have been developed [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…Dozens of examples of time-domain electro-optic-sampling measurements have appeared in the literature over the past 20 years. They highlight the applications of the technique in high-bandwidth-photodetector characterization [3], discrete-device analysis [4], the extraction of clock and large-signal waveforms from within digital and nonlinear circuits [5], the measurement of pulsed, terahertz signals [6], and other areas.…”
mentioning
confidence: 99%